Zobrazeno 1 - 10
of 42
pro vyhledávání: '"J. Trube"'
Autor:
N. Barkova, J. Trubetskikh
Publikováno v:
Вестник университета, Vol 0, Iss 6, Pp 39-42 (2018)
To date, the world market includes many companies and to get into, and even more so to stay among the world leaders is quite difficult for the company. In the course of many years of world practice, a number of basic rules have been worked out, which
Externí odkaz:
https://doaj.org/article/f61a990041dc4a18afb6335277e80627
Akademický článek
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Publikováno v:
SID Symposium Digest of Technical Papers. 31:1084-1087
The influence of process power, process pressure, discharge voltage and film thickness on electrical and morphological properties of low resistivity ITO films is presented. SEM images and AFM measurements show that flat ITO films for light emitting p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1de14f8889d03f971c58ec3accf235da
https://doi.org/10.1889/1.1832853
https://doi.org/10.1889/1.1832853
Publikováno v:
Thin Solid Films. 354:100-105
With the r.f.-superimposed DC-magnetron sputtering process transparent and conducting indium-tin-oxide (ITO) films were deposited. The optical, electrical and structural properties of films deposited with different process parameters were investigate
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::428d1e1e2abdee897bf79382713ef94a
https://doi.org/10.1016/s0040-6090(99)00558-1
https://doi.org/10.1016/s0040-6090(99)00558-1
Publikováno v:
Microelectronic Engineering. 17:193-197
For high throughput with X-ray lithography, a very sensitive X-ray resist, good X-ray transparency of the mask and high exposure power are required. This leads to a local temperature rise of the X-ray masks due to the absorbed power and, therefore, t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5754f5173069c77ef6a7d29bee7cc2a4
https://doi.org/10.1016/0167-9317(92)90040-x
https://doi.org/10.1016/0167-9317(92)90040-x
Autor:
M. Ruske, J. Müller, Bernd Rech, J. Trube, G. Schöpe, Oliver Kluth, Xin Jiang, Bernd Szyszka, G. Bräuer
Large area (320×400 mm2) glass/ZnO-films were prepared by high-rate d.c. magnetron sputtering from ceramic targets and compared to lab-type r.f.- and m.f.-sputtered ZnO. The very uniform and initially smooth films exhibit excellent electrical and op
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7356e4f44a92e77af251a4cae4fa2e10
https://publica.fraunhofer.de/handle/publica/199680
https://publica.fraunhofer.de/handle/publica/199680
Diamond is intensively under discussion as membrane material for X-ray masks. Its high optical transparency and its high thermal conductivity, its very low thermal expansion coefficient and its high Young's modulus favours diamond over other material
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c3ef20e1f18468c3fc2729e3ba5f28a4
https://publica.fraunhofer.de/handle/publica/181161
https://publica.fraunhofer.de/handle/publica/181161
Autor:
A. Heuberger, J. Trube
In this contribution the requirements and application of organic resist materials in synchrotron lithography are discussed. The physico-chemical reactions in the resists are described on applying the principle of synchrotron lithography, using the av
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::179283ed28ff2518863ee81b8cdee247
https://publica.fraunhofer.de/handle/publica/178185
https://publica.fraunhofer.de/handle/publica/178185
For the fabrication of ULSI circuits, it is necessary to master sub-half micron design rules, which include an efficient patterning procedure and critical dimensions related overlay requirements. In addition to the alignment accuracy, the overlay bud
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9798de939a2d9160dadaa7000422b5a8
https://publica.fraunhofer.de/handle/publica/178678
https://publica.fraunhofer.de/handle/publica/178678
A copying procedure for reproduction of e-beam written X-ray masks has been developed and applied, for the fabrication of optically transparent stepper masks. This process uses normal X-ray lithography to expose an X-ray absorber pattern onto a resis
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f5619106b2f7676d5db8015962988dfd
https://publica.fraunhofer.de/handle/publica/179020
https://publica.fraunhofer.de/handle/publica/179020