Zobrazeno 1 - 10
of 55
pro vyhledávání: '"J. T. Yount"'
Publikováno v:
Journal of Applied Physics. 77:699-705
Electron spin resonance spectroscopy is used to study the effects of thermal NH3 nitridation and subsequent reoxidation on the structure of the dielectric/silicon interface. This is accomplished by study of the Pb center, an interfacial point defect.
Publikováno v:
IEEE Transactions on Nuclear Science. 41:1854-1863
Oxynitrides have been grown by oxidation in N/sub 2/O in a standard thermal oxidation furnace. Two N/sub 2/O processes have been studied: oxidation in N/sub 2/O only, and two-step oxidation with initial oxidation in O/sub 2/ followed by oxidation/nit
Autor:
Patrick M. Lenahan, J. T. Yount
Publikováno v:
Journal of Non-Crystalline Solids. :1069-1072
We present evidence supporting the designation of the bridging nitrogen center as the dominant electron trap in NH 3 -nitrided and reoxidized nitrided oxide dielectric films. This defect, an unpaired electron highly localized in a nearly pure 2 p -or
Publikováno v:
Journal of Applied Physics. 74:5867-5870
Electron spin resonance of Pb centers is used to probe the dielectric/silicon interface in NH3‐nitrided oxide (NO) and reoxidized nitrided oxide (RNO) dielectrics. The Pb spectra observed in the NO and RNO systems differ from Si/SiO2 systems only i
Publikováno v:
IEEE Transactions on Nuclear Science. 39:2211-2219
X-ray irradiated oxide, nitrided oxide, and reoxidized nitrided oxide films were studied with electron spin resonance. Nitridation of oxide films reduces the density of radiation-induced E' centers and creates bridging nitrogen center precursors, whi
Publikováno v:
Journal of Applied Physics. 70:4969-4972
Room‐temperature metastable paramagnetic point defects are created in plasma‐enhanced chemical vapor deposited silicon oxynitride films by exposing the films to ultraviolet and vacuum ultraviolet illumination. We compare the response of films wit
Publikováno v:
MRS Proceedings. 338
In this work, an electron spin resonance study of NH3-nitrided, N2O-nitrided, and N2O-grown oxides yields information relating the process history, point defect structure, and electrical behavior. NH3-nitridation is responsible for the introduction o
Autor:
Frantz, Elias B., Harmon, Nicholas J., Michalak, David J., Henry, Eric M., Flatté, Michael E., King, Sean W., Clarke, James S., Lenahan, Patrick M.
Publikováno v:
Journal of Applied Physics; 12/21/2021, Vol. 130 Issue 23, p1-10, 10p
Autor:
Moxim, Stephen J., Sharov, Fedor V., Hughart, David R., Haase, Gaddi S., McKay, Colin G., Frantz, Elias B., Lenhan, Patrick M.
Publikováno v:
Review of Scientific Instruments; 11/1/2022, Vol. 93 Issue 11, p1-7, 7p
Autor:
Frantz, Elias B., Michalak, David J., Harmon, Nicholas J., Henry, Eric M., Flatté, Michael E., King, Sean W., Clarke, James S., Lenahan, Patrick M.
Publikováno v:
Applied Physics Letters; 11/1/2021, Vol. 119 Issue 18, p1-5, 5p