Zobrazeno 1 - 10
of 46
pro vyhledávání: '"J. Schreckenbach"'
Conversion layers by plasma-electrolytic oxidation of aluminum in acrylate and benzoate electrolytes
Autor:
T. Mehner, J. Schreckenbach, W. A. Goedel, D. R. T. Zahn, R. Morgenstern, T. Lampke, O. Selyshchev
Publikováno v:
IOP Conference Series: Materials Science and Engineering. 1147:012005
Within this work, aluminum is oxidized via plasma-electrolytic oxidation (PEO) in the presence of organic substances, including reactive monomers. The aim of this approach is to generate polymers and simultaneously bind them to the surface of the fre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edd1d4bf3a964dbafd8115fa5be281e1
https://doi.org/10.1088/1757-899x/1147/1/012005
https://doi.org/10.1088/1757-899x/1147/1/012005
Publikováno v:
Solid State Sciences. 10:1605-1611
This work presents the results of investigation of the behavior of as-grown and annealed in air at 200 °C in phosphoric acid alumina films during the first and repeated polarizations in the barrier-type anodizing solution under potential sweep condi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0ab9b6afb63a89880b8285e49e9f39d0
https://doi.org/10.1016/j.solidstatesciences.2008.03.004
https://doi.org/10.1016/j.solidstatesciences.2008.03.004
Publikováno v:
Electrochimica Acta. 53:300-304
The embedded charge in the barrier layers of porous alumina, formed potentiostatically in phosphoric acid was studied as a function of anodizing voltage (30–57 V) and bath temperature (18 and 21 °C). For that, the polarization measurements of as-g
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::757fe3025df7dffb185f2b7d50bf5a3c
https://doi.org/10.1016/j.electacta.2007.04.038
https://doi.org/10.1016/j.electacta.2007.04.038
Publikováno v:
Applied Surface Science. 253:4680-4687
The growth of porous oxide films on aluminum (99.99% purity), formed in 4% phosphoric acid was studied as a function of the anodizing voltage (23–53 V) using a re-anodizing technique and transmission electron microscopy (TEM) study. The chemical di
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52dc79000b33a40fbbb8d5984d448ce4
https://doi.org/10.1016/j.apsusc.2006.10.038
https://doi.org/10.1016/j.apsusc.2006.10.038
Publikováno v:
Microchimica Acta. 156:173-179
Chemical dissolution of the barrier layer of porous oxide films formed on an aluminum foil (99.5% purity) in 1.5 M sulfanic acid after immersion in a 2 mol dm−3 sulphuric acid at 50 °C was studied. The barrier layer thickness before and after diss
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::99a28100bb306902b99edee05c3e414e
https://doi.org/10.1007/s00604-006-0609-7
https://doi.org/10.1007/s00604-006-0609-7
Publikováno v:
Applied Surface Science. 252:5100-5108
Chemical dissolution of the barrier layer of porous oxide films formed on aluminum foil (99.5% purity) in the 4% phosphoric acid after immersion in 2 mol dm−3 sulphuric acid at 50 °C has been studied. The barrier layer thickness before and after d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::608a366b75aa3d90baebfc9971fcd65b
https://doi.org/10.1016/j.apsusc.2005.07.028
https://doi.org/10.1016/j.apsusc.2005.07.028
Publikováno v:
Applied Surface Science. 252:227-233
Chemical dissolution of the barrier layer of porous oxide formed on thin aluminum films (99.9% purity) in the 4% oxalic acid after immersion in 2 mol dm−3 sulphuric acid at 50 °C has been studied. The barrier layer thickness before and after disso
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19565a3731eff296a6b948a83c4bf612
https://doi.org/10.1016/j.apsusc.2005.02.024
https://doi.org/10.1016/j.apsusc.2005.02.024
Publikováno v:
Applied Surface Science. 242:333-338
The effects of the anodizing voltage on the porous alumina film formation on Al foil in 4% phosphoric acid at 20 °C have been studied. The barrier layer thickness of porous films was determined by a re-anodizing technique. A digital voltmeter with a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::782c7c618e1f88b0c39c0d2e3565deb5
https://doi.org/10.1016/j.apsusc.2004.08.034
https://doi.org/10.1016/j.apsusc.2004.08.034
Publikováno v:
Applied Surface Science. 236:270-277
Chemical dissolution of the barrier layer of alumina films formed on 98% aluminium in the 4% oxalic acid after immersion in 2 mol dm −3 sulphuric acid at 50 °C have been studied. The barrier layer thickness before and after dissolution was determi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3ade38d77227afb04eeece540bf4bd8
https://doi.org/10.1016/j.apsusc.2004.04.030
https://doi.org/10.1016/j.apsusc.2004.04.030
Publikováno v:
Applied Surface Science. 222:215-225
The volume expansion factor of porous alumina, formed by through anodizing of an Al foil of thickness 11.5 mm in the range of current densities of 4–35 mA cm � 2 in oxalic and sulfuric acid at 18–24 8C has been studied. The microstructure of an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c12651f4a4ad33b8c110371c25cf27d8
https://doi.org/10.1016/j.apsusc.2003.08.014
https://doi.org/10.1016/j.apsusc.2003.08.014