Zobrazeno 1 - 10
of 105
pro vyhledávání: '"J. R. Conrad"'
Autor:
D P Shutt, D W Goodsman, K Martinez, Z J L Hemez, J R Conrad, C Xu, D Osthus, C Russell, J M Hyman, C A Manore
Publikováno v:
Journal of medical entomology. 59(6)
While the number of human cases of mosquito-borne diseases has increased in North America in the last decade, accurate modeling of mosquito population density has remained a challenge. Longitudinal mosquito trap data over the many years needed for mo
Publikováno v:
Journal of Soil Contamination. 7:467-480
Phytoremediation is a natural, aesthetically pleasing, low-cost technology that employs plant-influenced microbial, chemical, and physical processes to remediate contaminated soils and waters. The Institute of Gas Technology (IGT) conducted a laborat
Autor:
N.P. Baker, J. R. Conrad, J.T. Scheuer, Carter P. Munson, Kumar Sridharan, R.A Bruen, Michael Nastasi, Blake P. Wood, Kevin C. Walter, Shamim M. Malik, W.K. Scarborough
Publikováno v:
Surface and Coatings Technology. :205-211
Recent activities in plasma source ion implantation (PSII) technology include scale-up demonstrations for industry and development of variations on the original PSII concept for surface modification. This paper presents an overview of the continued g
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:2875-2879
Plasma source ion implantation (PSII) is a relatively simple technique for the ion implantation/deposition of materials. In PSII a substrate is immersed in a plasma, and high negative voltage pulses are applied to accelerate ions into the substrate r
Publikováno v:
Materials Science Forum. :409-412
Autor:
A. Chen, R.A. Dodd, Kumar Sridharan, A.A. Elmoursi, X. Qiu, W.G. Horne, A.H. Hamdi, G.W. Malaczynski, J. R. Conrad
Publikováno v:
Surface and Coatings Technology. 82:305-310
There is growing concern over the environmental toxicity and workers' health issues due to the chemical baths and rinse water used in the hard chromium plating process. In this regard the significant hardening response of chromium to nitrogen ion imp
Autor:
Rajiv Shivpuri, M. M. Shamim, J. R. Conrad, R.P. Fetherston, Y.-L. Chu, Kumar Sridharan, K. Venkatesan
Publikováno v:
Wear. 192:49-55
An accelerated testing procedure with a multi-pin die has been established for the study of the erosive wear of die materials and surface treatments in die casting applications, under production conditions. This test procedure utilizes the wear of co
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 106:522-526
Pure (99.999%) aluminum has been implanted with nitrogen using a plasma source ion implantation process. A glow discharge plasma and a 50 kV bias were used to achieve a retained dose of ∼ 10 18 N-at/cm 2 . Some samples were Ar sputter-cleaned prior
Autor:
J. R. Conrad, Matthew Goeckner, R. A. Breun, N. C. Horswill, William Nicholas Guy Hitchon, Eric R. Keiter, M. M. Shamim, T. E. Sheridan, R.P. Fetherston
Publikováno v:
Physical Review E. 51:3760-3763
Publikováno v:
Journal of Applied Physics. 77:1015-1019
A wedge‐shaped target was implanted with nitrogen ions using the plasma source ion implantation process, in order to understand the effects of the target edges on the energy and fluence distribution of incident ions. Experimental measurements and a