Zobrazeno 1 - 10
of 13
pro vyhledávání: '"J. R. Brews"'
Publikováno v:
Microelectronic Engineering. 28:155-161
The variations in current induced by variations in the (horizontal) doping profile between channel and drain or source can be described in terms of variations in the effective channel length L EFF induced by the variations in the doping profile of so
Publikováno v:
Journal of Vacuum Science and Technology. 13:1047-1055
Two frequently observed problems with Schottky diodes are soft current–voltage characteristics and low avalanche breakdown voltages. These problems are sometimes found immediately upon fabrication, or they may develop during use. It is proposed tha
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 46:2181-2192
A three‐dimensional perturbation‐theory treatment of the carrier‐density fluctuations in the insulated‐gate field‐effect transistor (IGFET) above threshold and their effect upon the source‐drain current is presented. The fluctuations are
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 46:2193-2203
The behavior of the inversion‐layer mobility observed in the IGFET at biases close to threshold is explained in terms of small fluctuations in the density of minority carriers. These fluctuations are in response to localized charges at the oxide‐
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 45:1276-1279
Minority carriers within the inversion layer of an inverted MOS capacitor can move in response to a high‐frequency ac signal even though the total minority‐carrier charge is fixed at the value set by the dc bias. In this paper a simple explicit f
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 44:3228-3231
It is shown that the apparent doping profile obtained from a 1/CHF2 vs V plot (where CHF is the high‐frequency MOS capacitance and V is the voltage across the capacitor) can be corrected for interface‐state effects to obtain a more accurate dopin
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 43:2306-2313
Small‐signal conductance peaks in metal‐oxide‐semiconductor (MOS) devices have been found experimentally to be much wider than predicted by the surface‐state continuum model of Lehovec. This increased width has been attributed by Nicollian an
Autor:
J. R. Brews, C. J. Hwang
Publikováno v:
The Journal of Chemical Physics. 54:3263-3268
It is shown that the local relation EF = μ(n, T) + eΦ(x) relating the Fermi level EF, the chemical potential μ, and an electrostatic potential Φ(x), does not predict the correct dependence of the electron density, n, upon position, x, for every c
Autor:
J. R. Brews
Publikováno v:
Journal of Applied Physics. 44:379-384
Carriers can be injected into the oxide of a metal‐oxide‐semiconductor (MOS) capacitor by illuminating either electrode with ultraviolet light. Once injected, a voltage across the capacitor will cause the injected carriers to flow, constituting a
Autor:
J. R. Brews
Publikováno v:
Physical Review B. 6:3142-3145