Zobrazeno 1 - 10
of 52
pro vyhledávání: '"J. Pandolfi"'
Autor:
Alejandro Castiglioni, Pablo Roitman, Nicolás Cóccaro, J. Pandolfi, Nicholas J Rene, Federico Jauk
Publikováno v:
AJSP: Reviews and Reports. 26:38-44
Publikováno v:
Pediatric and developmental pathology : the official journal of the Society for Pediatric Pathology and the Paediatric Pathology Society. 25(2)
We present a 29-month-old male patient in follow-up due to pyelocaliceal dilation with a prostatic nodule incidentally found during ultrasound evaluation. Cysto video endoscopy was performed and a prostate biopsy, obtained. Microscopic evaluation sho
Autor:
G. Recondo, S. Akselrad, F. Jauk, P. Teves, J. Pandolfi, L. Basbus, C.A. Franco Cortes, H. Garcia Rivello, R. Sanchez Marull, Y. Powazniak, J. Calderazzo, M.V. Bluthgen, S.N. Sena, A. Perfetti, P.P. Levit, N. Castagneris, M.M. Rizzo, L. Lupinacci, J.N. Minatta
Publikováno v:
Annals of Oncology. 33:S968
Akademický článek
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Akademický článek
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Autor:
Isvar A. Cordova, Dinesh Kumar, Guillaume Freychet, Alex Hexemer, Patrick P. Naulleau, Ron J. Pandolfi, Cheng Wang
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
As the lithographically manufactured nanostructures are shrinking in size, conventional techniques, such as microscopies (SEM, AFM) reach their resolution limits. We have developed a high-performance Grazing Incidence SAXS simulation tool to reconstr
Autor:
Peter Ercius, Isvar A. Cordova, Guillaume Freychet, Dinesh Kumar, Chengyu Song, Alexander Hexemer, Joseph Strzalka, Patrick P. Naulleau, Ron J. Pandolfi
Publikováno v:
Physical Review Applied, vol 12, iss 4
Author(s): Freychet, G; Kumar, D; Pandolfi, RJ; Naulleau, P; Cordova, I; Ercius, P; Song, C; Strzalka, J; Hexemer, A | Abstract: The semiconductor industry is continuously pushing the limits of photolithography, with feature sizes now smaller than 10
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b91dccbfa33dc28b2bc92d9db4a04cbf
https://escholarship.org/uc/item/6ks0c95w
https://escholarship.org/uc/item/6ks0c95w
Autor:
J.N. Minatta, Federico Jauk, L. Basbus, Mercedes Dalurzo, L. Lupinacci, A. Antivero, Y. Ferreira, H. Garcia Rivello, J. Pandolfi
Publikováno v:
Journal of Thoracic Oncology. 16:S1035
Autor:
C.A. Franco Cortes, F. Cayol, Mercedes Dalurzo, Federico Jauk, J.N. Minatta, Y. Ferreira, H. Garcia Rivello, L. Lupinacci, J. Pandolfi, A. Antivero
Publikováno v:
Journal of Thoracic Oncology. 16:S1157
Autor:
Gian Lorusso, Isvar A. Cordova, Guillaume Freychet, Dinesh Kumar, Alexander Hexemer, Ron J. Pandolfi, Patrick P. Naulleau
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIII.
As the lithographically manufactured nanostructures are shrinking in size, conventional techniques, such as Scanning Electron Microscopes and Atomic Force Microscopes reach their resolution limits [1]. Novel inline scatterometry techniques not only p