Zobrazeno 1 - 1
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pro vyhledávání: '"J. P. Formica"'
Autor:
C. Wyon, D. K. Agnihotri, J. P. Formica, F. Cacho, Y. Tsach, L. F. Tz. Kwakman, J.‐P. Gonchond, G. Rolland, G. Braeckelmann
Publikováno v:
AIP Conference Proceedings.
X ray reflectivity (XRR) is shown to be well suited to measure the thickness of NiSi films annealed at different temperatures. The phase transformation during the silicide reaction at different spike annealing temperatures (310°C–450°C) has been
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e952200d05c9af4f186ab6192c1c7e6f
https://doi.org/10.1063/1.2062960
https://doi.org/10.1063/1.2062960
