Zobrazeno 1 - 2
of 2
pro vyhledávání: '"J. P. Custy"'
Autor:
W. F. Connelly, James Alexander Liddle, Warren K. Waskiewicz, Anthony E. Novembre, Harry H. Wade, Chester S. Knurek, L. Rutberg, R. DeMarco, C. Biddick, J. P. Custy, A. H. Crorken, J. S. Kraus, Joseph A. Felker, Pat G. Watson, K. S. Werder, H. A. Huggins, Stephen W. Bowler, Lloyd R. Harriott, Milton L. Peabody, Richard J. Kasica, R. R. Freeman, K. Brady, Steven D. Berger, Regine G. Tarascon-Auriol, Myrtle I. Blakey, Masis Mkrtchyan, L. Fetter, Reginald C. Farrow, R. M. Camarda, David Lee Windt, L. C. Hopkins
Publikováno v:
SPIE Proceedings.
We have designed, constructed, and are now performing experiments with a proof-of-concept projection electron-beam lithography system based upon the SCALPELR (scattering with angular limitation projection electron-beam lithography) principle. This in
Autor:
M. Mkrtychan, L. C. Hopkins, Harry H. Wade, K. Brady, Steven D. Berger, A. H. Crorken, Myrtle I. Blakey, J. P. Custy, Joseph A. Felker, G. P. Watson, C. Biddick, W. F. Connelly, Reginald C. Farrow, Anthony E. Novembre, Milton L. Peabody, R. M. Camarda, K. S. Werder, R. Dimarco, David Lee Windt, R. G. Tarascon, Chester S. Knurek, H. A. Huggins, R. R. Freeman, J. S. Kraus, Stephen W. Bowler, L. Fetter, James Alexander Liddle, L. R. Harriott, W. K. Waskiewicz
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 14:3825
We have designed and constructed a proof‐of‐concept projection electron beam lithography system based on the scattering with angular limitation projection electron beam lithography principle. In this system, a thin membrane mask is used in a 4:1