Zobrazeno 1 - 10
of 36
pro vyhledávání: '"J. P. Biersack"'
Autor:
A. Blass, J. P. Biersack
Publikováno v:
Radiation Effects and Defects in Solids. 153:103-114
We present a novel scheme for calculating electronic energy losses and their higher moments which allows to fully account for the electronic structure of solids. Typical structures in solid materials are found in metals with their half filled conduct
Publikováno v:
Radiation Effects and Defects in Solids. 145:213-223
SIMS (Secondary Ion Mass Spectroscopy) is extensively used in microelectronics in order to measure the depth profiles of dopants in silicon wafers. During the SIMS analysis, the sputtering ion beam induces several mass transport processes (collisiona
Autor:
Jose Fernando Diniz Chubaci, J. P. Biersack, Kiyoshi Ogata, Shigueo Watanabe, Fuminori Fujimoto
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 116:452-456
Increasing efforts have been reported on the formation of carbon nitride. Vapor deposition and simultaneous ion bombardment from accelerators or plasmas (IBAD) proved to be a successful technique for the preparation of this material. In our preparati
Autor:
J. P. Biersack, P. Goppelt-Langer
Publikováno v:
Radiation Effects and Defects in Solids. 140:103-109
A new time-of-flight detector arrangement has been developed and optimised for elastic recoil detection analysis (ERDA). In contrast to other ERDA detectors, recoil masses are restricted to values below 40. Then incident ions in the mass range below
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 13:1999-2004
Auger electron spectroscopy depth profiling was carried out on amorphous Ge–Si multilayer structures of 2 and 3 nm layer thicknesses using a dedicated Auger depth profiling instrument that rotates the specimen during sputtering and applies a grazin
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 12:2368-2372
Auger electron spectroscopy depth profiling was carried out on a Ge–Si multilayer structure using a rotated specimen and grazing incidence angle. Under these sputtering conditions the depth resolution is determined mainly by atomic mixing. The depe
Autor:
Miklós Menyhárd, Arpad Barna, Kenneth Järrendahl, J. E. Sundgren, J. P. Biersack, Attila Sulyok
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 85:383-387
AES depth profiling was carried out on a Ge-Si multilayer structure using rotated specimen and grazing incidence angle. Under these sputtering conditions the depth resolution is determined mainly by atomic mixing. The dependence of the experimentally
Publikováno v:
Radiation Effects and Defects in Solids. 127:349-355
The angular dependence of the physical sputtering yield of germanium bombarded by Ar ions has been studied at 23 keV and 30 keV. The sputtering yield increases with increasing incident angle and reaches a maximum around 70° to 75°. Results are comp
Autor:
J. P. Biersack, S. T. Nakagawa, A. La Ferla, Alberto Carnera, G. Galvagno, Vito Raineri, Emanuele Rimini
Publikováno v:
Radiation Effects and Defects in Solids. 116:211-217
The profiles of boron ions impinging along the axis of silicon single crystal at energies in the 80–700 keV range were measured by SIMS. By a simple subtraction procedure the distributions for aligned incidence of the beam were decomposed into a ra
Autor:
H. H. Bertschat, H. E. Mahnke, R. Kowallik, Stefan Seeger, H. Haas, K. H. Biedermann, W. Müller, J. P. Biersack, W.-D. Zeitz
Publikováno v:
Physical Review Letters. 64:2695-2698
A pronounced difference in magnetic behavior at distinct lattice sites has been found for recoil-implanted 54 Fe ions in fcc cerium metal using the perturbed-angular-distribution method. Of the implanted ions 25(5)% show predominantly spin magnetism