Zobrazeno 1 - 10
of 16
pro vyhledávání: '"J. N. Helbert"'
Publikováno v:
Journal of Vacuum Science and Technology. 16:1992-1995
The positive electron beam resist exposure characteristics of poly (methacrylonitrile) (PMCN), poly(methyl α‐chloroacrylate) (PMCA), and two MCA/MCN copolymers have been obtained using conventional techniques. The 1:1 MCA/MCN copolymer is found to
Autor:
J. N. Helbert, Joseph A. Potenza, B. E. Wagner, J. W. Linowski, Richard D. Bates, Edward H. Poindexter
Publikováno v:
Journal of the American Chemical Society. 98:4405-4409
Publikováno v:
Chemical Physics Letters. 52:546-548
Strongly scalar 1 H intermolecular dynamic nuclear polarization (DNP) of solvent 1 H nuclei in solutions of organic free radicals has now been observed at room temperature. Transient protonation of the CF 3 COOH/pyridyl imidazoline-1-oxyl radical sys
Autor:
J. H. Lai, J. N. Helbert
Publikováno v:
Macromolecules. 11:617-619
Autor:
Joseph A. Potenza, R. D. Jun. Bates, J. N. Helbert, Edward H. Poindexter, Burkhard E. Wagner, J. W. Linowski
Publikováno v:
Chemischer Informationsdienst. 7
Publikováno v:
Surface and Colloid Science in Computer Technology ISBN: 9781461290605
Microelectronic device fabrication currently relies totally upon photoresist processing for pattern delineation in integrated circuit fabrication. Adhesion of polymeric photoresist patterns, especially those of submicron dimensions, to the various su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c8abcdcfc0795ea5a4ac1eb46e73855
https://doi.org/10.1007/978-1-4613-1905-4_7
https://doi.org/10.1007/978-1-4613-1905-4_7
Autor:
M. A. Schmidt, J. N. Helbert
Publikováno v:
ACS Symposium Series ISBN: 9780841207158
Polymer Materials for Electronic Applications
Polymer Materials for Electronic Applications
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::12755a93cc21ecfc67961feca1a8e8cf
https://doi.org/10.1021/bk-1982-0184.ch005
https://doi.org/10.1021/bk-1982-0184.ch005
Autor:
N. C. Saha, J. N. Helbert
Publikováno v:
Polymers for High Technology ISBN: 9780841214064
Polymers for High Technology: Electronics and Photonics
Polymers for High Technology: Electronics and Photonics
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3cac1cbb588b314d8bd5e0f7f8da8186
https://doi.org/10.1021/bk-1987-0346.ch021
https://doi.org/10.1021/bk-1987-0346.ch021
Autor:
H. G. Hughes, J. N. Helbert
Publikováno v:
Adhesion Aspects of Polymeric Coatings ISBN: 9781461336600
Improved photoresist adhesion has been obtained for several halogen, amine, or alkoxy substituted organosilanes under both wet etching induced “undercutting” and simple wet development resist “lifting” conditions. The increased adhesion is at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::56c8293fafe6393f71d350f8ec07097f
https://doi.org/10.1007/978-1-4613-3658-7_29
https://doi.org/10.1007/978-1-4613-3658-7_29
Publikováno v:
SPIE Proceedings.
A commercially available positive photoresist, Polychrome 129 SF, has been evaluated as both a positive electron beam resist and photoresist. The photoresist sensitivity, measured uniquely for a given developer based upon image dimensional control, i