Zobrazeno 1 - 10
of 441
pro vyhledávání: '"J. Machet"'
Akademický článek
Tento výsledek nelze pro nepřihlášené uživatele zobrazit.
K zobrazení výsledku je třeba se přihlásit.
K zobrazení výsledku je třeba se přihlásit.
Publikováno v:
Thin Solid Films. 347:46-55
Chromium films were produced on steel substrates by d.c. magnetron sputtering in pure argon at a target power density of 2, 4, 10 or 16 W/cm 2 applying a negative substrate bias voltage, V s , ranging from 4 to 1000 V. The substrate temperature varie
Publikováno v:
Materials Science Forum. :131-140
Autor:
J. Machet, C. Gautier-Picard
Publikováno v:
Materials Science Forum. :393-396
Ternary chromium based films (Cr,O,N) have been deposited using the vacuum arc evaporation technique in a reactive (O 2 + N 2 ) atmosphere. The influence of the oxygen flow rate (Q o2 ) on the structural and mechanical properties of the coatings, has
Publikováno v:
Materials Science Forum. :539-542
The films are obtained by ion plating. Chromium is evaporated by electron beam bombardment in an electrical discharge generated in a pure nitrogen atmosphere. The determination of the number and the energy of the particles impinging on the growing fi
Publikováno v:
Optical Materials. 10:143-153
Thin films of hexagonal boron nitride (h-BN) have been prepared using a reactive ion plating process. Investigations of guiding and optical properties of films have been performed using m-line spectroscopy. Both ordinary and extraordinary refractive
Publikováno v:
High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes). 2:391-399
Publikováno v:
Surface and Coatings Technology. 97:60-65
Titanium boronitride coatings were deposited by reactive magnetron cosputtering. The Ti and the TiB2 targets were sputtered by using an Ar–N2 gas mixture. The deposition configuration allowed us to obtain a composition gradient along the substrate
Publikováno v:
Surface and Coatings Technology. :409-415
CrN coatings are obtained by ion plating (IP) and by vacuum arc evaporation (VAE) in identical deposition chambers. The parameters governing the growth mechanisms are systematically controlled and measured during the deposition process, i.e. the nitr
Autor:
J. Machet, C. Gautier
Publikováno v:
Surface and Coatings Technology. :422-427
Ternary chromium based films (Cr, O, N) have been deposited using a conventional arc coating system. The effect of N2 and O2 partial pressures, pO2, PN2 on the formation of the Cr-O-N compounds and on the structural properties (texture, grain size, r