Zobrazeno 1 - 10
of 51
pro vyhledávání: '"J. M. E. Harper"'
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 28:838-841
The authors investigated the texture and microstructure evolution of Cu1−xAgx composite thin films through x-ray diffraction pole figures as a function of composition for x≤0.5. As codeposited at room temperature by magnetron sputtering, the fcc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f9a72e626a16a8868a3ad49ae7d26b
https://doi.org/10.1116/1.3319349
https://doi.org/10.1116/1.3319349
Autor:
D. Deniz, J. M. E. Harper
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 27:63-66
The authors studied the development of crystallographic texture in hafnium nitride (HfN) films deposited by off-normal incidence reactive magnetron sputtering at room temperature. Films are prepared with and without added oxygen in N2∕Ar mixtures.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::28c15df625eaeb258649aa9b2a3ef877
https://doi.org/10.1116/1.3039680
https://doi.org/10.1116/1.3039680
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 25:1214-1218
The authors report a strong dependence of fiber texture tilt angle on the gas composition in aluminum nitride (AlN) thin films prepared by off-normal reactive magnetron sputtering in N2∕Ar mixtures. Using x-ray pole figures, they measured the c-axi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c833d70e479fded51995f31821f44a4f
https://doi.org/10.1116/1.2712190
https://doi.org/10.1116/1.2712190
Autor:
Christian Lavoie, Cyril Cabral, Jean Jordan-Sweet, F. M. d'Heurle, Andrew J. Kellock, J. M. E. Harper, Christophe Detavernier
Publikováno v:
Microelectronic Engineering. 83:2042-2054
Alloying elements can substantially affect the formation and morphological stability of nickel monosilicide. A comprehensive study of phase formation was performed on 24 Ni alloys with varying concentrations of alloying elements. Silicide films have
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2495103fa986ce78c603c1c85f6ed1a4
https://doi.org/10.1016/j.mee.2006.09.006
https://doi.org/10.1016/j.mee.2006.09.006
Publikováno v:
Journal of Materials Research. 20:3391-3396
The resistivities of as-deposited Cu(4.2Ir), Cu(2.0W), and Cu(2.2W) films are 32.2, 25.4, and 28.0 μΩcm, respectively. These resistivities are significantly higher thanthat for pure Cu films. After annealing the Cu(4.2Ir) film at constant heating r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7c9644bc388080d9b6bad5840223f12e
https://doi.org/10.1557/jmr.2005.0416
https://doi.org/10.1557/jmr.2005.0416
Autor:
James R. Lloyd, Lynne Gignac, Chenming Hu, X.-H. Liu, J. M. E. Harper, R. F. Liu, A. K. Stamper
Publikováno v:
Journal of Applied Physics. 95:3737-3744
Electromigration lifetime was studied on 0.23 μm wide Cu dual-damascene lines connected to underlying W lines with a TaN/Ta liner and SiNx/SiO2 insulator. The failure criteria used to study electromigration lifetime were based on the increase in tes
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50d62860de64e09e6c14075505e8d3d8
https://doi.org/10.1063/1.1650887
https://doi.org/10.1063/1.1650887
Autor:
H. R. Kaufman, J. M. E. Harper
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:221-224
We present simple, convenient procedures for calculating ion doses for ion-assist applications such as cleaning and property modification. For many of these applications, gridless ion sources of the end-Hall type are particularly well-suited to the g
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39c5d1ba3a8cb4d194a4b2716a2c5d3a
https://doi.org/10.1116/1.1633565
https://doi.org/10.1116/1.1633565
Publikováno v:
Journal of Applied Physics. 94:1605-1616
The impact of 11 alloying elements, namely, Mg, Ti, In, Sn, Al, Ag, Co, Nb, and B, at two nominal concentrations of 1 and 3 at. %, and Ir and W, at only a nominal concentration of 3 at. %, on the resistivity and grain structure of copper was investig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::20af97f96924809d07b53a3115e74d0d
https://doi.org/10.1063/1.1589593
https://doi.org/10.1063/1.1589593
Publikováno v:
Journal of Applied Physics. 92:7210-7218
Texture development in (Ti,Ta)Si2, formed from Ti–Ta alloy (0–6 at. % Ta) thin films sputtered on Si(001) and poly-Si substrates, was studied using both in situ and ex situ x-ray diffraction. The addition of Ta fundamentally changes the C54 textu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::890ceaa93f3fe67b5d50562199c4c4dc
https://doi.org/10.1063/1.1519338
https://doi.org/10.1063/1.1519338
Publikováno v:
Journal of Applied Physics. 92:5189-5195
The transformation from the C49 to the C54 phase in TiSi2 thin films has been studied for more than a decade because of its importance to the semiconductor industry. In previous work we identified three dominant C54 orientations in TiSi2 thin films o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e1c322ef260036538d5d3310d96f550
https://doi.org/10.1063/1.1512687
https://doi.org/10.1063/1.1512687