Zobrazeno 1 - 10
of 11
pro vyhledávání: '"J. M. Donato"'
Autor:
J. N. Leboeuf, J. M. Donato, David B. Geohegan, R. F. Wood, J. H. Hes, Alexander A. Puretzky, Kuan-Ren Chen, T. C. King
Publikováno v:
Physical Review B. 60:8373-8382
A self-similar theory and numerical hydrodynamic modeling is developed to investigate the effects of dynamic source and partial ionization on the acceleration of the unsteady expansion of laser-ablated material near a solid target surface. The dynami
Autor:
Alexander A. Puretzky, Kuan-Ren Chen, J. M. Donato, D. B. Geobegan, J. N. Leboeuf, R. F. Wood, C. L. Liu
Publikováno v:
Materials Science and Engineering: B. 47:70-77
A combined theoretical and experimental effort to model various physical processes during laser ablation of solids using a variety of computational techniques is described. Currently the focus of the modeling is on the following areas: (a) rapid tran
Autor:
J. N. Leboeuf, R. F. Wood, C. L. Liu, Kuan-Ren Chen, David B. Geohegan, Alexander A. Puretzky, J. M. Donato
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 14:1111-1114
A dynamic source effect was found to accelerate the plume expansion velocity much higher than that from a conventional free‐expansion model. A self‐similar theory and a hydrodynamic model are developed to study this effect, which may help to expl
Autor:
J. N. Leboeuf, J. M. Donato, David B. Geohegan, Kuan-Ren Chen, R. F. Wood, C. L. Liu, Alexander A. Puretzky
Publikováno v:
Physics of Plasmas. 3:2203-2209
The transport dynamics of laser-ablated neutral/plasma plumes are of significant interest for film growth by pulsed-laser deposition of materials since the magnitude and kinetic energy of the species arriving at the deposition substrate are key proce
Autor:
Kuan-Ren Chen, R. F. Wood, C. L. Liu, J. N. Leboeuf, David B. Geohegan, J. M. Donato, Alexander A. Puretzky
Publikováno v:
Applied Surface Science. :45-49
An annealing model is extended to treat the vaporization process, and a hydrodynamic model describes the ablated material. We find that dynamic source and ionization effects accelerate the expansion front of the ablated plume with thermal vaporizatio
Autor:
R. F. Wood, David B. Geohegan, C. L. Liu, Kuan-Ren Chen, J. M. Donato, Alexander A. Puretzky, J. N. Leboeuf
Publikováno v:
Applied Surface Science. :14-23
Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the v
Autor:
J. N. Leboeuf, David B. Geohegan, Alexander A. Puretzky, Kuan-Ren Chen, R. F. Wood, C. L. Liu, J. M. Donato
Publikováno v:
Physical Review Letters. 75:4706-4709
A dynamic source effect that accelerates the expansion of laser-ablated material in the direction perpendicular to the target is demonstrated. A self-similar theory shows that the maximum expansion velocity is proportional to {ital c}{sub {ital s}}/{
Autor:
J. M. Donato, Kuan-Ren Chen, J. N. Leboeuf, David B. Geohegan, R. F. Wood, C. L. Liu, Alexander A. Puretzky
Publikováno v:
MRS Proceedings. 388
Several physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed laser deposition of materials. these include thermal models of laser-solid target interactions that initiate the v
Autor:
J. N. Leboeuf, J. M. Donato, Alexander A. Puretzky, R. F. Wood, C. L. Liu, David B. Geohegan, Kuan-Ren Chen
Publikováno v:
MRS Proceedings. 388
Plasma generation through vapor breakdown during ablation of a Si target by nanosecond KrF laser pulses is modeled using 0-dimensional rate equations. Although there is some previous work on vapor breakdown by microsecond laser pulses, there have bee
Autor:
David B. Geohegan, Alexander A. Puretzky, Kuan-Ren Chen, R. F. Wood, C. L. Liu, J. M. Donato, J. N. Leboeuf
Publikováno v:
MRS Proceedings. 388
Rapid transformations through the liquid and vapor phases induced by laser-solid interactions are described by our thermal model with the Clausius-Clapeyron equation to determine the vaporization temperature under different surface pressure condition