Zobrazeno 1 - 10
of 35
pro vyhledávání: '"J. Lingnau"'
Autor:
Th. Wimmer, M. Van Ooteghem, W. Schneider, J. Setter, C. Müller-Goymann, M. Folger, T. Rades, R. G. Werner, H. Langlouis-Gau, J. Friesejones, R. Rössler, Lösungsmittel Wasser, C.-D. Herzfeldt, C.-M. Lommer, K. Knop, B. C. Lippold, E. Nürnberg, B. Nürnberg, H. Egermann, I. Benes, H. Ungeheuer, K. Klokkers-Bethke, G. Schepky, M. Dittgen, E. Spingler, M. Bornschein, J. Ziegenmeyer, J. Lingnau
Publikováno v:
Hagers Handbuch der pharmazeutischen Praxis ISBN: 9783642647611
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7d30b9479087cfc276a57394f323e30
https://doi.org/10.1007/978-3-642-61249-7_4
https://doi.org/10.1007/978-3-642-61249-7_4
Publikováno v:
Polymer Engineering and Science. 29:874-877
The application of X-Ray lithography in mass production of devices is only economically viable if resist materials of highest sensitivity can be provided. Chemical amplification is the key concept to achieve such performance. It is outlined for a hig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b0f9f4a4b63feb3038a4789e18ec938
https://doi.org/10.1002/pen.760291309
https://doi.org/10.1002/pen.760291309
Publikováno v:
European Polymer Journal. 16:785-791
The mechanism of the spontaneous polymerization of methyl methacrylate (MMA) is still unknown. We now present evidence for the formation of 1.1.2.2-tetrasubstituted cyclobutanes in a side-reaction confirming, by the kinetics of their formation, the p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2564d88fa35e2d5582679008b236ad53
https://doi.org/10.1016/0014-3057(80)90050-6
https://doi.org/10.1016/0014-3057(80)90050-6
Autor:
Alfred Forchel, S. Pongratz, J. Theis, U. Scheunemann, Ralph R. Dammel, A. Menschig, J. Lingnau
Publikováno v:
Microelectronic Engineering. 9:571-574
The suitability of a newly developed x-ray resist for electron beam lithography has been investigated. RAY-PF is a Novolak-based three component system which uses a catalytic reaction to increase the sensitivity. The resist id found to have a high se
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d33c7b46eef5c6675532a4b5d46d6b50
https://doi.org/10.1016/0167-9317(89)90122-6
https://doi.org/10.1016/0167-9317(89)90122-6
Autor:
J. Lingnau, G. Meyerhoff
Publikováno v:
Macromolecules. 17:941-945
Reaction beaucoup plus rapide que pour la methacrylate de methyle catalyse intramoleculaire
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4b5ce435f1c2d3a42e7ae66549ac00cb
https://doi.org/10.1021/ma00134a068
https://doi.org/10.1021/ma00134a068
Autor:
G. Meyerhoff, J. Lingnau
Publikováno v:
Polymer. 24:1473-1478
The rate of the spontaneous polymerization of methyl methacrylate is strongly affected by the addition of transfer agents. The kinetics are interpreted in terms of a participation of transfer agents in the initiation step. In this, the original birad
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f1ca700ecbc8d7612f83c266e2ca83d1
https://doi.org/10.1016/0032-3861(83)90233-1
https://doi.org/10.1016/0032-3861(83)90233-1
Publikováno v:
Microelectronic Engineering. 6:503-509
The technological benefits of novolak-based two component resists may be incorporated into resists of higher sensitivity by making use of the concept of “chemical amplification”. A respective resist formulation by Hoechst offers sensitivities of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1bfd49f055b3a458fe8370129d61b8cb
https://doi.org/10.1016/0167-9317(87)90080-3
https://doi.org/10.1016/0167-9317(87)90080-3
Autor:
J. Lingnau
Publikováno v:
Drug Development and Industrial Pharmacy. 15:1029-1046
Validation in the definition adopted by a Joint FIP Committee means that every essential operation in the development, manufacture and control of pharmaceutical products is reliable, reproducible and capable of providing the desired product quality i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff08b35013b793726f5f6751181990ea
https://doi.org/10.3109/03639048909043663
https://doi.org/10.3109/03639048909043663
Akademický článek
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A negative-tone photocatalytic resist material for X-ray lithography with high resolution and good process stability is presented. It is based on acid-catalysed crosslinking of a novolak matrix with a melamine type compound. Design considerations are
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::080604c10e39e6af0c05f193ff382619
https://publica.fraunhofer.de/handle/publica/177485
https://publica.fraunhofer.de/handle/publica/177485