Zobrazeno 1 - 10
of 433
pro vyhledávání: '"J. Lingnau"'
Autor:
Th. Wimmer, M. Van Ooteghem, W. Schneider, J. Setter, C. Müller-Goymann, M. Folger, T. Rades, R. G. Werner, H. Langlouis-Gau, J. Friesejones, R. Rössler, Lösungsmittel Wasser, C.-D. Herzfeldt, C.-M. Lommer, K. Knop, B. C. Lippold, E. Nürnberg, B. Nürnberg, H. Egermann, I. Benes, H. Ungeheuer, K. Klokkers-Bethke, G. Schepky, M. Dittgen, E. Spingler, M. Bornschein, J. Ziegenmeyer, J. Lingnau
Publikováno v:
Hagers Handbuch der pharmazeutischen Praxis ISBN: 9783642647611
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7d30b9479087cfc276a57394f323e30
https://doi.org/10.1007/978-3-642-61249-7_4
https://doi.org/10.1007/978-3-642-61249-7_4
Publikováno v:
Polymer Engineering and Science. 29:874-877
The application of X-Ray lithography in mass production of devices is only economically viable if resist materials of highest sensitivity can be provided. Chemical amplification is the key concept to achieve such performance. It is outlined for a hig
Publikováno v:
European Polymer Journal. 16:785-791
The mechanism of the spontaneous polymerization of methyl methacrylate (MMA) is still unknown. We now present evidence for the formation of 1.1.2.2-tetrasubstituted cyclobutanes in a side-reaction confirming, by the kinetics of their formation, the p
Autor:
Alfred Forchel, S. Pongratz, J. Theis, U. Scheunemann, Ralph R. Dammel, A. Menschig, J. Lingnau
Publikováno v:
Microelectronic Engineering. 9:571-574
The suitability of a newly developed x-ray resist for electron beam lithography has been investigated. RAY-PF is a Novolak-based three component system which uses a catalytic reaction to increase the sensitivity. The resist id found to have a high se
Autor:
J. Lingnau, G. Meyerhoff
Publikováno v:
Macromolecules. 17:941-945
Reaction beaucoup plus rapide que pour la methacrylate de methyle catalyse intramoleculaire
Autor:
G. Meyerhoff, J. Lingnau
Publikováno v:
Polymer. 24:1473-1478
The rate of the spontaneous polymerization of methyl methacrylate is strongly affected by the addition of transfer agents. The kinetics are interpreted in terms of a participation of transfer agents in the initiation step. In this, the original birad
Publikováno v:
Microelectronic Engineering. 6:503-509
The technological benefits of novolak-based two component resists may be incorporated into resists of higher sensitivity by making use of the concept of “chemical amplification”. A respective resist formulation by Hoechst offers sensitivities of
Autor:
J. Lingnau
Publikováno v:
Drug Development and Industrial Pharmacy. 15:1029-1046
Validation in the definition adopted by a Joint FIP Committee means that every essential operation in the development, manufacture and control of pharmaceutical products is reliable, reproducible and capable of providing the desired product quality i
Autor:
Whitfield, Richard1 (AUTHOR), Jones, Glen R.1 (AUTHOR), Truong, Nghia. P.1 (AUTHOR), Manring, Lewis E.2 (AUTHOR), Anastasaki, Athina1 (AUTHOR) athina.anastasaki@mat.ethz.ch
Publikováno v:
Angewandte Chemie. 9/18/2023, Vol. 135 Issue 38, p1-9. 9p.
Autor:
Fareh, Raouf1 (AUTHOR) rfareh@sharjah.ac.ae, Elsabe, Ammar2 (AUTHOR), Baziyad, Mohammed3 (AUTHOR), Kawser, Tunajjina4 (AUTHOR), Brahmi, Brahim5 (AUTHOR), Rahman, Mohammad H.6 (AUTHOR)
Publikováno v:
Sensors (14248220). Jun2023, Vol. 23 Issue 11, p5054. 31p.