Zobrazeno 1 - 10
of 175
pro vyhledávání: '"J. L. Stehle"'
Publikováno v:
Journal of Modern Optics. 56:27-31
Rapid growth methods used to synthesize potassium dihydrogen phosphate crystals (KDP) and their partially deuterated form (DKDP) have been shown to increase the level of their impurities. These impurities may have a strong impact on the optical perfo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de388edd3daab16a378d9cbf10597ed4
https://doi.org/10.1080/09500340802428322
https://doi.org/10.1080/09500340802428322
Publikováno v:
Journal of Physics D: Applied Physics. 26:2096-2099
Spectroscopic ellipsometry is a widely used technique for the determination of the optical and geometrical characteristics of complex multilayered structures. We show in this communication that photostimulated ellipsometry is able to account for the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2435bbc195b14bbe8103030103f640a
https://doi.org/10.1088/0022-3727/26/11/039
https://doi.org/10.1088/0022-3727/26/11/039
Publikováno v:
Thin Solid Films. 234:375-379
This contribution presents a new kind of spectroscopic ellipsometry under modulated or pulsed external excitation when the sample physical properties (such as the refractive indices or thicknesses, e.g. in a layered structure) can be changed by the a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16461dbf64734dd586f3ad14ae8a6860
https://doi.org/10.1016/0040-6090(93)90289-2
https://doi.org/10.1016/0040-6090(93)90289-2
Autor:
S. Bourtault, Darwin Gene Enicks, L. Sun, I-L Teng, P. Hendrich, J.-L. Stehle, C. Defranoux, J. Rubino
Publikováno v:
2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530).
The ability to precisely determine epilayer thickness and Ge concentration in Si/sub 1-x/Ge/sub x/ is essential for calibrating growth processes and thus control film quality. Spectroscopic ellipsometry is a nondestructive optical technique and has a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::495aaee859851eed83f097072650c749
https://doi.org/10.1109/asmc.2004.1309609
https://doi.org/10.1109/asmc.2004.1309609
Autor:
J.-L. Stehle, P. Boher, P. Weidner, R. Wienhold, M. Bucchia, U. Mantz, P.-Y. Guittet, M. Rimane
Publikováno v:
Advanced Semiconductor Manufacturing Conference and Workshop, 2003 IEEEI/SEMI.
IRSE proposes a complementary type of characterization to widely accepted UV-VIS ellipsometry. IRSE is sensitive to absorption bands (vibrational and rotational states of molecules) and free carriers. IRSE reduces also sensitivity to scattering due t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::abc623e5cdde2dda5fb9ebb0d851ed35
https://doi.org/10.1109/asmc.2003.1194501
https://doi.org/10.1109/asmc.2003.1194501
Autor:
B. Biasse, J.-L. Stehle
Publikováno v:
1990 IEEE SOS/SOI Technology Conference. Proceedings.
A nondestructive optical technique, spectroscopic ellipsometry (SE), used to control top SiO/sub 2/, silicon, and buried SiO/sub 2/ layer thicknesses, as well as interfaces of these layers during SIMOX (separation by implantation of oxygen) wafer fab
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e422a6e0640c67de410a15651654eae
https://doi.org/10.1109/sossoi.1990.145757
https://doi.org/10.1109/sossoi.1990.145757
Publikováno v:
Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).
A new phase shifting interferometry based on the integrating-bucket technique with sinusoidal phase modulation is presented. The phase modulation is achieved by sinusoidal oscillation of an objective and a mirror attached to a PZT. Phase images are p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::289c4304f2d8e424041afc6a5e3a4bfd
https://doi.org/10.1109/imnc.2001.984182
https://doi.org/10.1109/imnc.2001.984182
Publikováno v:
Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468).
Multilayer structures for 157 nm lithography show thinner and thinner layer thickness and are more and more sensitivity to the interface and surface roughness. The metrology of this kind of structure becomes very difficult to achieve with only one si
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54e06883da940e41c6524b8c18d162c6
https://doi.org/10.1109/imnc.2001.984210
https://doi.org/10.1109/imnc.2001.984210
Ultraviolet, Vacuum Ultraviolet, and Extreme Ultraviolet Spectroscopic Reflecometry and Ellipsometry
Publikováno v:
Handbook of Silicon Semiconductor Metrology
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::646f0f3f730448045c1576fa9df64a6c
https://doi.org/10.1201/9780203904541.ch26
https://doi.org/10.1201/9780203904541.ch26
Publikováno v:
Review of Scientific Instruments
Review of Scientific Instruments, 2001, 72, pp.2834. ⟨10.1063/1.1369625⟩
Review of Scientific Instruments, American Institute of Physics, 2001, 72, pp.2834. ⟨10.1063/1.1369625⟩
Review of Scientific Instruments, 2001, 72, pp.2834. ⟨10.1063/1.1369625⟩
Review of Scientific Instruments, American Institute of Physics, 2001, 72, pp.2834. ⟨10.1063/1.1369625⟩
International audience; DNA microarrays are important new objects for biologists, offering new methods for high speed genetic studies. Many of them are manufactured by depositing small spots, containing DNA molecules, on a coated glass slide. The qua
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::74db35b20ae440e44375fa20514027e8
https://hal.science/hal-00627975/document
https://hal.science/hal-00627975/document