Výsledky vyhledávání

Moisture resistance and thermal stability of fluorine-incorporation siloxane-based low-dielectric-constant material

Autor: Chyung Ay, M. L. O'Neil, Yi-Lung Cheng, You-Lin Wu, Ying-Lang Wang, M. S. Feng, J. K. Lan, Chee-Wee Liu, Chuan-Pu Liu

Publikováno v: Thin Solid Films. :681-687

The low dielectric constant (low-k) of organo-silica-glass (OSG) and fluorine-incorporated OSG (OFSG) materials produced from plasma-enhanced chemical vapor deposition of trimethylsilane are thermally stable to greater than 600 °C. FTIR analysis ind

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1c44c2df514d76af10259bbbf97cd584
https://doi.org/10.1016/j.tsf.2003.09.006

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Inhibition of β-Lactamases by Monocyclic Acyl Phosph(on)ates

Autor: R. F. Pratt, S. A. Adediran, Martin J. K. Lan, Kamaljit Kaur

Publikováno v: Biochemistry. 42:1529-1536

The cyclic acyl phosph(on)ates, 1-hydroxy-5-phenyl-2,6-dioxaphosphorinone(3)-1-oxide, its 4-phenyl isomer, and the phosphonate (2-oxo) analogue of the latter inhibited typical class A (TEM-2) and class C (Enterobacter cloacae P99) beta-lactamases in

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3c29730e16d23d50d78e9d4267d67219
https://doi.org/10.1021/bi020602q

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Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application

Autor: Chuan-Pu Liu, Chih-Wei Liu, Ying-Lang Wang, You-Lin Wu, J. K. Lan, Y. L. Cheng, Kuang Yao Lo

Publikováno v: Thin Solid Films. :533-538

Fluorosilicate Glass (FSG) with low dielectric constant currently has been replaced as an alternative to SiO2 for device speed improvement. However, several integration aspects, such as Fluorine (F) distribution, F thermal stability, gap fill capabil

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ce74e4ca35b8cab7c7b2afd4ece15e14
https://doi.org/10.1016/s0040-6090(01)01314-1

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Study the impact of liner thickness on the 0.18 μm devices using low dielectric constant hydrogen silsesquioxane as the interlayer dielectric

Autor: Y. L. Cheng, Ying-Lang Wang, Shao-Yu Chiu, Huey-Chiang Liou, M. S. Feng, You-Lin Wu, J. K. Lan, J.K Wang

Publikováno v: Thin Solid Films. :776-780

The electrical performance of hydrogen silsesquioxane (HSQ) as the interlayer level dielectric (ILD) has been determined by using two-metal-layered test structures to study the impact of oxide liner thickness on the capacitance reduction. In comparis

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::fc056f28ca0c55c96b0d8bd204edcd33
https://doi.org/10.1016/s0040-6090(00)01289-x

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Akademický článek

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Study of Fab tool waste drain separation and reduction application in Bump process

Autor: C. N. Chang, James Lu, J. K. Lan, C. J. Tu, K. C. Liu, Tony Lien, W. M. Chen, Wei-Jen Huang, Edward Tseng, Larry Lai

Publikováno v: 2013 e-Manufacturing & Design Collaboration Symposium (eMDC).

All chemical reduction were achieved by Background study of chemicals used and discharged behavior in Fab tools, Waste drain concentration analysis, Fab tools adjustment of the PM procedure, Cu free etching chemical replacement, Theoretical waste vs.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f26e3d18641b64b189af157a996b845c
https://doi.org/10.1109/emdc.2013.6756060

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MES system solution for PLAT recipe reduction

Autor: J. K. Lan, Justin Lo, Joseph Chang, Jeff Huang, Larry Jann, Karen Mai

Publikováno v: 2012 e-Manufacturing & Design Collaboration Symposium (eMDC).

For recipe reduction requirement of bump plating process, we provided the MES system solutions — recipe parameters, product table and conversion function in SiView SpecMgr. Recipe parameter could help to define different process conditions by speci

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6392ea22e0b157bf6f615e8ff0b0a2bc
https://doi.org/10.1109/emdc.2012.6338426

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Akademický článek

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Mechanism of inhibition of the class C beta-lactamase of Enterobacter cloacae P99 by cyclic acyl phosph(on)ates: rescue by return

Autor: Martin J. K. Lan, R. F. Pratt, Kamaljit Kaur

Publikováno v: Journal of the American Chemical Society. 123(43)

As previously described (Pratt, R. F.; Hammar, N. J. J. Am. Chem. Soc. 1998, 120, 3004.), 1-hydroxy-4,5-benzo-2,6-dioxaphosphorinone(3)-1-oxide (salicyloyl cyclic phosphate) inactivates the class C beta-lactamase of Enterobacter cloacae P99 in a cova

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::228f78af6a53c5dd0ecc4ba549c0917b
https://pubmed.ncbi.nlm.nih.gov/11673973

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Investigation of N2 Plasma Effects on the Density Profile of Hydrogen Silsesquioxane Thin Films

Autor: J. K. Lan, Wen-Li Wu, M. S. Feng, C. G. Chao, Y. L. Cheng, B. M. Fanconi, Hae-Jeong Lee, Y. L. Wang, E. K. Lin, Huey-Chiang Liou

Publikováno v: MRS Proceedings. 714

The density depth profile and chemical bond structure of hydrogen silsesquioxane (HSQ) thin films treated with an N2 plasma with varying power and exposure time were measured using specular x-ray reflectivity (SXR) and Fourier transform infrared (FTI

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::55d0dc986114cc59959988b581ec697d
https://doi.org/10.1557/proc-714-l7.10.1

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