Zobrazeno 1 - 4
of 4
pro vyhledávání: '"J. K. Lampert"'
Publikováno v:
Thin Solid Films. 191:55-67
TiN thin films were deposited by r.f. reactive sputtering. The as-deposited films and films heat treated at 300, 400 and 550 °C an air and N 2 were analyzed by different techniques, i.e. scanning electron microscopy, transmission electron microscopy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3006ee661b17f20e81bf5544637769d
https://doi.org/10.1016/0040-6090(90)90274-h
https://doi.org/10.1016/0040-6090(90)90274-h
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 8:2251-2254
Thin films consisting of individual iridium and aluminum layers were sputter deposited onto various substrates. These films were then heat treated in air or in vacuo at temperatures ranging from 300 to 850 °C. We have demonstrated by x‐ray photoel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9a1d6717de3ae0537c9018437b988331
https://doi.org/10.1116/1.576745
https://doi.org/10.1116/1.576745
Publikováno v:
Advances in Fine Particles Processing ISBN: 9781468479614
Secondary Ion Mass Spectrometry (SIMS) is used to study polycation adsorption behavior on hydrophilic, negatively charged aluminosilicate surfaces. In the SIMS experiment, bombardment of a sample surface by energetic particles gives rise to a populat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5261410ffa3f136656fdfc7da6b2ac5
https://doi.org/10.1007/978-1-4684-7959-1_18
https://doi.org/10.1007/978-1-4684-7959-1_18
Publikováno v:
Journal of Applied Physics. 66:1970-1974
The interfacial reaction between boron nitride and nickel aluminide was studied by diffusion bonding at 1000 °C. Samples annealed in air or vacuum yield the same results. The interdiffusion zone is enriched with Al. An ex situ fractured boron nitrid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::640058742f05d0594a285cee9fd82aaf
https://doi.org/10.1063/1.344334
https://doi.org/10.1063/1.344334