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Autor:
Colm O'Regan, P. Thrompenaars, Nikolay Petkov, Albert Romano-Rodriguez, J. J. L. Mulder, R. J. Dias, Justin D. Holmes
Publikováno v:
Journal of Physics: Conference Series. 371:012038
Electron beam-induced deposition (EBID) is a direct write process where an electron beam locally decomposes a precursor gas leaving behind non-volatile deposits. It is a fast and relatively in-expensive method designed to develop conductive (metal) o
Publikováno v:
Micromachines, Vol 12, Iss 1, p 8 (2020)
High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between
Externí odkaz:
https://doaj.org/article/3eb5876e3151482f8fad297a73284782