Zobrazeno 1 - 10
of 26
pro vyhledávání: '"J. H. Haeni"'
Autor:
Y. Li, J. H. Haeni, Xiaoqing Pan, Dmitri A. Tenne, P. Reiche, Costel Constantin, Haiping Sun, Wei Tian, Kj J. Choi, Long Qing Chen, D. G. Schlom, V. Vaithyanathan, Randall M. Feenstra, M. Bernhagen, Arsen Soukiassian, Q. X. Jia, X. X. Xi, Reinhard Uecker, C. B. Eom
Publikováno v:
Journal of Materials Research. 23:1417-1432
Commensurate BaTiO3/SrTiO3 superlattices were grown by reactive molecular-beam epitaxy on four different substrates: TiO2-terminated (001) SrTiO3, (101) DyScO3, (101) GdScO3, and (101) SmScO3. With the aid of reflection high-energy electron diffracti
Autor:
J. H. Haeni, Michael D. Biegalski, Susan Trolier-McKinstry, Darrell G. Schlom, C. D. Brandle, A. J. Ven Graitis
Publikováno v:
Journal of Materials Research. 20:952-958
The thermal expansion coefficients of DyScO3 and GdScO3 were determined from298 to 1273 K using x-ray diffraction. The average thermal expansion coefficients of DyScO3 and GdScO3 were 8.4 and 10.9 ppm/K, respectively. No phase transitions were detect
Autor:
Darrell G. Schlom, Long Qing Chen, B. Craigo, Wontae Chang, Wei Tian, Stephen K. Streiffer, Y. L. Li, Marilyn E. Hawley, Xiaoqing Pan, Steven W. Kirchoefer, Jeremy Levy, J. H. Haeni, Reinhard Uecker, Alexander K. Tagantsev, Patrick Irvin, P. Reiche, Somnath Choudhury
Publikováno v:
Nature. 430:758-761
Systems with a ferroelectric to paraelectric transition in the vicinity of room temperature are useful for devices. Adjusting the ferroelectric transition temperature (T(c)) is traditionally accomplished by chemical substitution-as in Ba(x)Sr(1-x)TiO
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 20:1332-1340
The critical aspects of the epitaxial growth of alkaline-earth oxides on silicon are described in detail. The step by step transition from the silicon to the alkaline-earth oxide as shown through reflection high energy electron diffraction is present
Autor:
J. H. Haeni, Darrell G. Schlom
Publikováno v:
MRS Bulletin. 27:198-204
As a first step in the identification of suitable alternative gate dielectrics for metal oxide semiconductor field-effect transistors (MOSFETs), we have used tabulated thermodynamic data to comprehensively assess the thermodynamic stability of binary
Autor:
Darrell G. Schlom, Xiaoqing Pan, J. H. Haeni, J. Lettieri, Jiechao Jiang, Wei Tian, C. D. Theis
Publikováno v:
Materials Science and Engineering: B. 87:282-291
Molecular beam epitaxy (MBE) has achieved unparalleled control in the integration of semiconductors at the nanometer level; its use for the integration of oxides with similar nanoscale customization appears promising. This paper describes the use of
Publikováno v:
Journal of Materials Research. 16:2013-2026
Epitaxial Srn+1TinO3n+1 thin films with n = 1–5 were synthesized on (001) SrTiO3 substrates by reactive molecular beam epitaxy. The structure and microstructure of the films were investigated by x-ray diffraction, transmission electron microbeam di
Publikováno v:
Journal of Electroceramics. 4:385-391
The growth of high quality multicomponent oxide thin films by reactive molecular beam epitaxy (MBE) requires precise composition control. We report the use of in situ reflection high-energy electron diffraction (RHEED) for the stoichiometric depositi
Autor:
Andrés Cantarero, Serge Nakhmanson, Quanxi Jia, Kyoung Jin Choi, Wei Tian, Karin M. Rabe, Xiaoqing Pan, Xiaoxing Xi, Axel Bruchhausen, Arsen Soukiassian, J. H. Haeni, Alejandro Fainstein, D. A. Tenne, Darrell G. Schlom, Long Qing Chen, Norberto D. Lanzillotti-Kimura, Chang-Beom Eom, Haiping Sun, V. Vaithyanathan, Ram S. Katiyar, D. M. Kim, Yulan Li
Publikováno v:
Science. 313:1614-1616
We demonstrated that ultraviolet Raman spectroscopy is an effective technique to measure the transition temperature ( T c ) in ferroelectric ultrathin films and superlattices. We showed that one-unit-cell-thick BaTiO 3 layers in BaTiO 3 /SrTiO 3 supe
Publikováno v:
Applied Physics Letters. 85:1967-1969
BaTiO3 thin films were grown on (001)SrTiO3 by reactive molecular beam epitaxy. Transmission electron microscopy studies showed that there is a high density of dislocation half-loops inside 8- and 12-nm-thick films. By thermal annealing at 1000°C, t