Zobrazeno 1 - 7
of 7
pro vyhledávání: '"J. H. Georger"'
Publikováno v:
Journal of The Electrochemical Society. 141:210-220
A new approach for the selective electroless (EL) metallization of surfaces is described. Surfaces are modified with a chemisorbed ligand‐bearing organosilane film, and then catalyzed with an aqueous Pd(II) catalyst solution. The catalyzed substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::711d38a938801874093c73d90ce0eb95
https://doi.org/10.1149/1.2054686
https://doi.org/10.1149/1.2054686
Autor:
Mu-San Chen, Tim S. Koloski, J. H. Georger, Charles S. Dulcey, Jeffrey M. Calvert, Walter J. Dressick
Publikováno v:
Advances in Resist Technology and Processing X.
Deep UV photochemical patterning of chemisorbed metal-binding (ligating) organosilane films has been previously used to demonstrate sub-0.5 micrometers patterned additive metallization by electroless deposition. Significant photospeed advantages have
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::29c131bea55d923d8c2e294b8966dc51
https://doi.org/10.1117/12.154800
https://doi.org/10.1117/12.154800
Autor:
Charles S. Dulcey, Gary S. Calabrese, J. H. Georger, Walter J. Dressick, H. A. Stever, Michael E. Thomas, Jeffrey M. Calvert
Publikováno v:
MRS Proceedings. 260
A process for creating patterns of metal-binding ligands on a variety of substrates is described. Deep UV patterning of chemisorbed ligand-bearing organosilane films creates modified surfaces that can selectively bind species such as Pd(II) via a cov
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22029dc3c8d45f4b0e3faf7c087857a7
https://doi.org/10.1557/proc-260-659
https://doi.org/10.1557/proc-260-659
Autor:
Charles S. Dulcey, J. H. Georger, Martin C. Peckerar, M. Anderson, M. L Rebbert, Jeffrey M. Calvert, D. Park, James J. Hickman
Publikováno v:
MRS Proceedings. 260
A process has been developed to produce regular arrays of hollow metal microstructures on substrates of choice. Optical lithography was used to define high aspect ratio structures in photoresist. The resist structures were selectively metallized by e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8a7769dfa968279b37c42596d7cc59e
https://doi.org/10.1557/proc-260-381
https://doi.org/10.1557/proc-260-381
Publikováno v:
MRS Proceedings. 260
A new process has been developed which allows electroless metal deposition on ordered arrays of resist structures with high aspect ratios (10–25 μm tall x 0.5–13 μm diameter). The fabricated structures have demonstrated ungated vacuum field emi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::38dc49ce5edc829343ce06f07c74aa55
https://doi.org/10.1557/proc-260-423
https://doi.org/10.1557/proc-260-423
Autor:
Charles S. Dulcey, J. H. Georger, Thomas L. Fare, David A. Stenger, Jeffrey M. Calvert, Victor Krauthamer
Publikováno v:
Science (New York, N.Y.). 252(5005)
Deep ultraviolet (UV) irradiation is shown to modify organosilane self-assembled monolayer (SAM) films by a photocleavage mechanism, which renders the surface amenable to further SAM modification. Patterned UV exposure creates alternating regions of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::80a1d122c32283f65d478a7a223165f9
https://pubmed.ncbi.nlm.nih.gov/2020853
https://pubmed.ncbi.nlm.nih.gov/2020853
Autor:
LARRY F. THOMPSON, C. GRANT WILLSON, SEIICHI TAGAWA, E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan, E. Chin, J. M. Kometani, Ying Jiang, David R. Bassett, N. Takeyama, Y. Ueda, T. Kusumoto, H. Ueki, M. Hanabata, H. Ito, Y. Maekawa, R. Sooriyakumaran, E. A. Mash, Eiichi Kobayashi, Makoto Murata, Mikio Yamachika, Yasutaka Kobayashi, Yoshiji Yumoto, Takao Miura, W. D. Hinsberg, S. A. MacDonald, C. D. Snyder, R. D. Allen, C.-P. Lei, T. Long, S. K. Obendorf, F. Rodriguez, Kwang-Duk Ahn, Deok-Il Koo, Yoshiaki Inaki, Nobuo Matsumura, Kiichi Takemoto, G. M. Wallraff, L. L. Simpson, R. R. Kunz, Masamitsu Shirai, Masahiro Tsunooka, K. Watanabe, E. Yano, T. Namiki, Y. Yoneda, J. M. Calvert, W. J. Dressick, C. S. Dulcey, M. S. Chen, J. H. Georger, D. A. Stenger, T. S. Koloski, G. S. Calabrese, V. Rao, C. W. Frank, R. F. W. Pease, James R. Sheats, Ralph Dammel, Michael T. Pottiger, John C. Coburn, M. F. Welker, H. R. Allcock, G. L. Grune, R. T. Chern, V. T. Stannett, Shinji Ando, Tohru Matsuura, Shigekuni Sasaki, K. Ushida, A. Kira, S. Tagawa, Y. Yoshida, H. Sh
