Zobrazeno 1 - 5
of 5
pro vyhledávání: '"J. E. Van Der Werf"'
Autor:
P. S. Zwart, J. E. Van Der Werf
Publikováno v:
MAB, Vol 70, Iss 5, Pp 250-260 (1996)
Externí odkaz:
https://doaj.org/article/68325147783941c0a6e2264e95097354
Autor:
Martinus Hendrikus Antonius Leenders, Jozef Petrus Henricus Benschop, Hans Meiling, Erik Roelof Loopstra, J. E. van der Werf
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 18:2921
In order to design an exposure tool for extreme-ultraviolet (EUV) lithography that adheres to technology roadmap requirements, we translated overall system performance requirements to system design specifications by setting up detailed error budgets
Autor:
J. E. van der Werf
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 10:735
A new optical focus system for wafer steppers, insensitive to structures on the wafer surface, is presented. It is based on the grazing‐incident beam method. In traditionally used monochromatic focus systems, interference effects in the layer stack
Publikováno v:
Journal of Physics D: Applied Physics. 5:266-279
The properties of the positive column of strongly modulated low-pressure gas discharges in mercury-rare gas mixtures have been studied, both experimentally and theoretically. The current was modulated sinusoidally with a modulation depth of 50%. Calc
Autor:
M. M. G. Vollebregt, A. Malfroot, M. De Raedemaecker, M. van der Burg, J. E. van der Werff ten Bosch
Publikováno v:
Case Reports in Immunology, Vol 2015 (2015)
Rapadilino syndrome is a genetic disease characterized by a characteristic clinical tableau. It is caused by mutations in RECQL4 gene. Immunodeficiency is not described as a classical feature of the disease. We present a 2-year-old girl with Rapadili
Externí odkaz:
https://doaj.org/article/dc3e24c3db24441c8bf4bbc17879c97d