Zobrazeno 1 - 10
of 411
pro vyhledávání: '"J. E. Sundgren"'
Autor:
K.Z. Xing, J.-E. Sundgren, X.T. Li, W.T. Zheng, Matsufumi Takaya, Jinghua Guo, Zengsun Jin, Yukihiro Sakamoto, P.J. Chao
Publikováno v:
Diamond and Related Materials. 10:1897-1900
Carbon nitride films are deposited using dc magnetron sputtering in a N2 discharge. The nature of chemical bonding of the films is investigated using X-ray photoelectron spectroscopy, near-edge X-r ...
Autor:
Kenneth Järrendahl, Lars Hultman, Esteban Broitman, Niklas Hellgren, Mats Johansson, G. Radnoczi, Sveinn Olafsson, J.-E. Sundgren
Publikováno v:
Journal of Applied Physics. 89:1184-1190
The electrical and optical properties of carbon-nitride CNx films (O=x=0.25) deposited by unbalanced reactive magnetron sputtering from a graphite target in mixed Ar/N2 discharges at a substrate te ...
Autor:
Esteban Broitman, Yan Wang, J.-E. Sundgren, Weitao Zheng, Hongdong Li, W.X. Yu, Zengsun Jin, P.J. Cao
Publikováno v:
Diamond and Related Materials. 9:1790-1794
Carbon nitride films are deposited on Si(001) substrates by reactive d.c. magnetron sputtering graphite in a pure N 2 discharge. The chemical bonding and structure of carbon nitride films were probed using Fourier transformation infrared (FTIR) and n
Publikováno v:
Thin Solid Films. 371:167-177
The influence of residual stress state and composition on the mechanical properties of arc evaporated TiCxN1−x thin films have been investigated. By controlling the flow ratios of the reactive gases, N2 and CH4, films with compositions x=0 (TiN), x
Publikováno v:
Surface and Coatings Technology. 126:1-14
TiCxN1-x films with x ranging from 0 to 1 were grown by arc evaporation by varying the flow ratio between the reactive gases. The substrates were cemented carbide inserts (WC-6 wt.% Co) which were negatively biased at 400 V, resulting in a deposition
Autor:
J.-E. Sundgren, Mats Johansson, Niklas Hellgren, Lars Hultman, Esteban Broitman, Torun Berlind
Publikováno v:
Thin Solid Films. 360:17-23
Symmetric CNx/BN:C multilayer thin films, with nominal compositional modulation periods of Λ=2.5, 5, and 9 nm were deposited by unbalanced dual cathode magnetron sputtering from C (graphite) and B4C targets in an Ar/N2 (60/40) discharge. The multila
Autor:
Nian Lin, Jens Birch, Erik B. Svedberg, Ragnar Erlandsson, TS Jemander, J.-E. Sundgren, Göran V. Hansson
Publikováno v:
Surface Science. 443:31-43
Studies of epitaxial growth of Mo thin films on MgO(001) substrates by ultrahigh Vacuum (UHV) d.c. magnetron sputter deposition have shown independently by in situ low energy electron diffraction ( ...
Publikováno v:
Surface Science. 436:L641-L647
Embedded-atom molecular-dynamics simulations were used to follow the diffusion dynamics of compact platinum clusters with up to 19 atoms on Pt(111). The results reveal a cluster diffusion mechanism on (111) face-centered-cubic (fcc) surfaces involvin
Publikováno v:
Surface Science. 431:16-25
The use of video recording of reflection high energy electron diffraction (RHEED) patterns for assessing the dynamic evolution of the surface morphology and crystallinity during growth was evaluated. As an example, Mo/V(001) superlattices with varyin
Publikováno v:
Thin Solid Films. 349:4-9
Thin films grown by sputtering and electron-beam evaporation typically show differences in structure and morphology, and thus in physical properties. In this paper we report on morphology and crystallographic structure of thin palladium films grown o