Zobrazeno 1 - 10
of 37
pro vyhledávání: '"J. E. A. M. van den Meerakker"'
Publikováno v:
Corrosion Science. 42:1169-1183
The oxidative behaviour of Ni80Fe20 (Permalloy) in an NH4F/HF solution was investigated. The influence of O2 concentration and the effects of short-circuiting Permalloy with a large area Pt or Alsimag electrode on the corrosion were studied. Current
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aa6c5fa0c15b2c58154ca8e9867ad67f
https://doi.org/10.1016/s0010-938x(00)00004-4
https://doi.org/10.1016/s0010-938x(00)00004-4
Publikováno v:
Thin Solid Films. 266:152-156
The etching behaviour of sputter-deposited tin-doped indium oxide (ITO) films in 8 M HCl solutions was investigated. The etch rate was mainly dependent on the microcrystallinity of the films. Amorphous ITO dissolved with an extremely high rate, while
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::09c54350bb0ae6b9e2e30df4d9fe95af
https://doi.org/10.1016/0040-6090(95)06742-6
https://doi.org/10.1016/0040-6090(95)06742-6
Publikováno v:
Thin Solid Films. 266:145-151
Tin-doped indium oxide films deposited by d.c. magnetron sputtering were characterized by electrical resistivity, optical transmission, X-ray diffraction (XRD), transmission electron microscopy and stress measurements. Deposition was performed at low
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a211011fb14d0153e6bcb0ef23644b4b
https://doi.org/10.1016/0040-6090(95)06818-x
https://doi.org/10.1016/0040-6090(95)06818-x
Publikováno v:
Journal of The Electrochemical Society. 142:2321-2325
The etching process of polycrystalline tin-doped indium oxide (ITO) films in HCl solutions is investigated by kinetic and electrochemical experiments and the patterning characteristics are examined by scanning electron microscopy. The influence of ox
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::edbf45e4775133bd74839cead4c0221b
https://doi.org/10.1149/1.2044294
https://doi.org/10.1149/1.2044294
Publikováno v:
Journal of Applied Physics. 74:3282-3288
Tin‐doped indium oxide (ITO) films, prepared by dc magnetron sputtering, were characterized by (photo)electrochemical measurements in aqueous H2SO4 solutions. Wavelength dependent photocurrent measurements were used to determine the optical band ga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bb0e9105be65fa739c0e9a63d5dc1800
https://doi.org/10.1063/1.354549
https://doi.org/10.1063/1.354549
Publikováno v:
Journal of The Electrochemical Society. 140:471-475
Tin‐doped indium oxide films, prepared by dc magnetron sputtering, have been investigated with respect to their etching behavior in a large number of acids. The etch rate in acids other than the halogen acids is extremely low. The films dissolve at
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8bcc2434549e75859738cb12e7789370
https://doi.org/10.1149/1.2221071
https://doi.org/10.1149/1.2221071
Publikováno v:
ChemInform. 23
Tin-doped indium oxide (ITO) layers show severe corrosion in alkaline solutions when they are in electrical contact with Al. This corrosion process is investigated by etching experiments, electrochemical measurements, and analytical techniques. It is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e213329ec93abe56a8bed9d27eceb5c5
https://doi.org/10.1002/chin.199216029
https://doi.org/10.1002/chin.199216029
Publikováno v:
Journal of Electroanalytical Chemistry. 333:205-216
One of the most striking aspects of etching Ti + W alloys in aqueous H 2 O 2 solutions is the decrease in etch rate under improved mass transport conditions. This aspect was studied by X-ray photoelectron spectroscopy (XPS) and electrochemical measur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fbfaca2155b3fdc136be993f96cb3d87
https://doi.org/10.1016/0022-0728(92)80392-h
https://doi.org/10.1016/0022-0728(92)80392-h
Publikováno v:
Journal of The Electrochemical Society. 139:385-390
Tin-doped indium oxide (ITO) layers show severe corrosion in alkaline solutions when they are in electrical contact with Al. This corrosion process is investigated by etching experiments, electrochemical measurements, and analytical techniques. It is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1f0e74365637a1d5faa21f9133f42d0
https://doi.org/10.1149/1.2069228
https://doi.org/10.1149/1.2069228
Publikováno v:
Thin Solid Films. 208:237-242
The etching process of Ti-W alloys in concentrated H 2 O 2 solutions is characterized by analytical and microscopic techniques and kinetic experiments. The influence of the Ti-W composition, the composition of the solution and the process parameters
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96689933ec43cd29a807a90fd3aab5e8
https://doi.org/10.1016/0040-6090(92)90649-v
https://doi.org/10.1016/0040-6090(92)90649-v