Zobrazeno 1 - 10
of 39
pro vyhledávání: '"J. C. Bean"'
Autor:
E. Kasper, J. C. Bean
Publikováno v:
Silicon-Molecular Beam Epitaxy ISBN: 9781351076623
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5766b4e22d308fea0a1888d61bd0c57
https://doi.org/10.1201/9781351076623-6
https://doi.org/10.1201/9781351076623-6
Autor:
R. A. Matula, J. C. Bean
Publikováno v:
Silicon-Molecular Beam Epitaxy ISBN: 9781351076623
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8051882973232fd0fa11a81d8d0eefb
https://doi.org/10.1201/9781351076623-7
https://doi.org/10.1201/9781351076623-7
Autor:
J L Gray, R Hull, N Singh, D M Elzey, J A Floro, P Kumar, T L Pernell, J C Bean, T Vandervelde
Publikováno v:
Microscopy of Semiconducting Materials 2003 ISBN: 9781351074636
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::24f063d513dc88112c6fd5dae056ac5b
https://doi.org/10.1201/9781351074636-56
https://doi.org/10.1201/9781351074636-56
Publikováno v:
Physical Review B. 58:4779-4784
Publikováno v:
Journal of The Electrochemical Society. 145:2465-2470
This paper describes the tribochemical reactions of silicon against a polymer pad as studied by attenuated total internal reflection Fourier transform infrared spectroscopy. The evolution of the silicon surface and chemical species formed on the surf
Autor:
Wei Cai, Leon McCaughan, Max G. Lagally, Thomas F. Kuech, E. Rudkevich, J. S. Sullivan, Donald E. Savage, S. Nayak, J. C. Bean
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 15:2153-2157
We show that it is possible to extend the lower limit of the spectral range of Fourier transform infrared-attenuated total reflection (FTIR-ATR) spectroscopy on Si surfaces from 1500 to ∼850 cm−1 using a Ge ATR prism coated with a thin epitaxial
Autor:
J. Dunkel, C. W. Roberts, W. Y. Han, J. C. Bean, L. Peticolas, Madan Dubey, L. C. West, Kenneth A. Jones
Publikováno v:
Journal of Applied Physics. 79:7157-7160
Germanium films were deposited on GaAs (100) substrates with or without an epiready surface oxide at temperatures between room temperature (RT) and 500 °C using an ultrahigh‐vacuum e‐beam deposition system. The film at 100 °C on a substrate wit
Publikováno v:
The Journal of Physical Chemistry. 99:14039-14051
Autor:
Koenraad G. F. Janssens, Herman Maes, J. C. Bean, O. Van der Biest, Robert Hull, J. Vanheliemont
Publikováno v:
Materials Science and Technology. 11:66-71
Understanding and controlling localised strain in semiconductor devices is one of the critical challenges confronting the designer of new technologies. Due to continuous scaling down in very large and ultralarge scale integration there is a growing r
Autor:
J. C. Bean, Robert Hull
Publikováno v:
Physica Status Solidi (a). 138:533-546
By in-situ annealing of metastably strained (Si)/GexSi1−x/Si heterostructures in a transmission electron microscope, it is possible to directly observe and measure misfit dislocation propagation velocities. These measurements correspond to differen