Zobrazeno 1 - 10
of 55
pro vyhledávání: '"J. C. Bae"'
Akademický článek
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Autor:
Hong Kim, 배지철 ( J. C. Bae )
Publikováno v:
Exercise Science. 19:381-390
Autor:
S. S. Kim, E. K. Choi, M. H. Park, H. J. Kim, H. S. Lee, W. -J. Kim, J. C. Bae, T. K. Song, I. -S. Kim, J. -S. Song, J. Y. Lee
Publikováno v:
Ferroelectrics. 328:139-143
We report on the ferroelectric properties of Bi 3.54 Nd 0.46 Ti 3 O 12 (BNT) thin films fabricated on Pt(111)/Ti/SiO 2 /Si substrates by a sol-gel process. The measured XRD patterns and SEM and TEM micrographs revealed that the films showed only a Bi
Publikováno v:
Transactions of Materials Processing. 14:417-422
Autor:
S. S. Kim, E. K. Choi, H. J. Kim, M. H. Park, H. S. Lee, W. J. Kim, J. C. Bae, T. K. Song, J. Y. Lee
Publikováno v:
Journal of Electroceramics. 13:83-88
Ferroelectric properties of samarium substituted Bi4Ti3O12 films, Bi3.15Sm0.85Ti3O12 (BST), were evaluated for use as lead-free thin film ferroelectrics for FeRAM applications. The BST films were fabricated on the Pt/Ti/SiO2/Si(100) substrates by a m
Autor:
Chung Gyu Park, S.-H. Suh, Bae Jun Oh, Jae Hyeon Kim, Min-Suk Lee, S. H. Oh, S.-M. Jin, Kang-Seok Kim, M. K. Lee, J. C. Bae
Publikováno v:
American journal of transplantation : official journal of the American Society of Transplantation and the American Society of Transplant Surgeons. 13(6)
Bone marrow-derived early endothelial progenitor cells (BM-EPCs) are a clinical tool for enhancing revascularization. However, the therapeutic efficacy of co-transplantation of BM-EPC with islets has not been investigated. In this study, marginal mas
Akademický článek
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Autor:
K.S. Kim, K.Y. Kim, Kitae Park, H. Kurino, J. C. Bae, M. Koyanagi, Yun Heub Song, K. Kato, E. Arakawa
Publikováno v:
International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).
This paper presents a novel technology to form an ultra-shallow source and drain extension (SDE) junctions for the future MOSFETs. In this technology, a dopant in an adsorbed layer on the Si surface diffuses into the substrate by the rapid thermal an
Publikováno v:
1999 57th Annual Device Research Conference Digest (Cat. No.99TH8393).
This paper proposes a novel source and drain junction technology for realizing sub 0.1 /spl mu/m NMOSFETs. In this technology, source and drain extension (SDE) is fabricated using arsenic (As) diffusion from as adsorbed atomic layer on silicon surfac
Publikováno v:
17th Congress of the International Commission for Optics: Optics for Science and New Technology.