Zobrazeno 1 - 10
of 137
pro vyhledávání: '"J. Auersperg"'
Publikováno v:
Microelectronics Reliability. 64:665-668
Silicon based pressure sensors often take advantage of piezo-resistive gages which are normally embedded by multiple silicon oxide and silicon nitride layers where gold lines form a Wheatstone bridge. As a result of manufacturing – stepwise deposit
Publikováno v:
2018 19th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).
Continuous downsizing and integration of various electrical features in micro-electric devices go along with an increase of electrical interconnections e.g. copper vias (vertical interconnect access) in BEoL-layers (back end of line) and through Sili
Silicon based pressure sensors often take advantage of piezo-resistive gages which are normally embedded by multiple silicon oxide and silicon nitride layers where gold lines form a Wheatstone bridge (Meti et al., 2016; Bae et al., 2004 [ 2 ]). Becau
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5eeb1b89dba8b29a89614ee39eeaeb9f
https://publica.fraunhofer.de/handle/publica/255802
https://publica.fraunhofer.de/handle/publica/255802
Publikováno v:
2017 IEEE 19th Electronics Packaging Technology Conference (EPTC).
The mechanical characterization of copper through silicon vias (TSV) is not feasible by means of classical material characterization methods like tensile testing due to the small size of the vias. Instead, instrumented nanoindentation is an appropria
Publikováno v:
2017 18th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).
Silicon based pressure sensors often take advantage of piezo-resistive gages which are normally embedded by multiple silicon oxide and silicon nitride layers where gold lines form a Wheatstone bridge. As a result of manufacturing - stepwise depositio
Autor:
Parisa Bayat, Dietrich R. T. Zahn, Raul D. Rodriguez, Sven Rzepka, J. Auersperg, Ellen Auerswald, Dietmar Vogel, Bernd Michel
Publikováno v:
Microelectronics Reliability. 54:1963-1968
Knowledge and control of local stress development in Back-End-of-Line (BEoL) stacks and nearby Through Silicon Vias (TSVs) in advanced 3D integrated devices is a key to their thermo-mechanical reliability. The paper presents a combined simulation/mea
Publikováno v:
Microelectronics Reliability. 54:1223-1227
3D-integration becomes more and more an important issue for advanced LED packaging solutions as it is a great challenge for the thermo-mechanical reliability to remove heat from LEDs to the environment by heat spreading or specialized cooling technol
Autor:
Reinhard Pufall, Georg M. Reuther, Patrick W. Kudella, J. Albrecht, Sven Rzepka, J. Auersperg, J. Brueckner
Publikováno v:
2016 IEEE 18th Electronics Packaging Technology Conference (EPTC).
Wire bonding as well as wafer probing can lead to oxide layer cracking in Backend of Line (BEOL) Bond Pad Stacks. This, along with metal migration into formed cracks, may lead to electrical failures. Mechanical loading conditions comparable to those
Autor:
Georg M. Reuther, J. Brueckner, Reinhard Pufall, J. Albrecht, Sven Rzepka, J Auersperg, Patrick W. Kudella
Publikováno v:
2016 6th Electronic System-Integration Technology Conference (ESTC).
We have presented an advanced FEM simulation model that is able to map the scenario of indentation of a diamond tip into a thin brittle SiN x :H film deposited on a Si substrate. Our 2D axisymmetric and 3D quarter and half models are able to reproduc
Publikováno v:
2016 17th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE).
Wire bonding as well as wafer probing can lead to oxide layer cracking. In combination with metal migration electrical failures may occur. Loading conditions comparable to the wire bonding process can be achieved using a nanoindenter. In this work a