Zobrazeno 1 - 10
of 12
pro vyhledávání: '"J. A. Slinkman"'
Autor:
H. G. Robinson, J. A. Slinkman, J. K. Listebarger, Mark E. Law, Kevin S. Jones, T. O. Sedgwick, D. D. Sieloff
Publikováno v:
Journal of Applied Physics. 78:2298-2302
A boron doped epilayer was used to investigate the interaction between end of range dislocation loops (formed from Ge+ implantation) and excess point defects generated from a low dose 1014/cm2 B+ implant into silicon. The boron doping spike was grown
Autor:
J. Liu, B. Herner, Kevin S. Jones, H. Park, J. K. Listebarger, Mark E. Law, D. D. Sieloff, Jia’er Chen, J. A. Slinkman, H. G. Robinson
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 96:196-201
Studies of the interactions between point defects introduced during semiconductor processing and dislocation loops are reviewed. The processing steps studied include oxidation, ion implantation and silicidation. By using doped marker layers it is sho
Publikováno v:
Physical Review B. 50:15197-15209
Publikováno v:
Physical Review B. 48:9162-9165
We have calculated spin-split electron wave functions and eigenenergies in a wide parabolic quantum well. Our calculation incorporates scattering, a range of many-body approximations, and an applied perpendicular magnetic field. We find unexpected be
Publikováno v:
Journal of Applied Physics. 73:4815-4819
Type‐II (end of range) defects, produced by Ge+ implantation, were investigated as possible ‘‘detectors’’ for quantifying nonequilibrium interstitial concentrations following B+ implantation into silicon. The type‐II damage was created wi
Publikováno v:
IBM Journal of Research and Development. 36:158-182
Many of the processes used in the fabrication of silicon integrated circuits lead to the development of stress in the silicon substrate. Given enough stress, the substrate will yield by generating dislocations. We examine the formation of stress-indu
Publikováno v:
Proceedings of IEEE International Electron Devices Meeting.
A point defect based model for the stress effects on dopant diffusion is presented. Binding energies and diffusivities of dopant-defect pairs under pressure are modeled and encapsulated into diffusion equations. Boron segregation around dislocation l
Publikováno v:
Physical review. B, Condensed matter. 46(12)
We have calculated self-consistent electron wave functions and eigenenergies in a wide parabolic quantum well subject to a perpendicular magnetic field. The spectra from these calculations naturally divide into three regions of magnetic-field strengt
Publikováno v:
Physical review. B, Condensed matter. 45(19)
Recently, Kunze investigated electric subbands in the inversion layer on degenerate p-type InAs by means of Zener tunneling. He inferred energy separations between low-lying subbands in a sample with bulk acceptor concentration in the ${10}^{17}$ ${\
Publikováno v:
Physical review. B, Condensed matter. 41(1)
An analytic formula is described for fitting the magnetic field B(z) or vector potential A(z) in pure superconducting aluminum with specular scattering of electrons at the surface. The error in the fit to the vector potential as predicted by the BCS