Zobrazeno 1 - 10
of 109
pro vyhledávání: '"J. A. Bilello"'
Publikováno v:
Thin Solid Films. 518:2037-2044
In this work, the failure modes of thin films under thermo-mechanical treatments were observed via in-situ white beam X-ray topography. The in-situ experiments were carried out using an experimental setup on Beamline 2-2 at the Stanford Synchrotron R
Publikováno v:
Journal of Materials Research. 21:1645-1657
The microstructures of Tl2Ba2Ca1Cu2O8 (Tl-2212) films are very strongly influenced by the processing parameters used to synthesize the superconducting phase and also control the microwave surface resistance values that are of key importance in the ap
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 24:195-201
Mo films were deposited via magnetron sputtering with two different deposition geometries: dynamic deposition (moving substrate) and static deposition (fixed substrate). The residual stress and structural morphologies of these films were investigated
Publikováno v:
Journal of Physics D: Applied Physics. 38:A44-A49
A novel white-beam synchrotron radiography/topography substrate curvature technique has been used to study stress development in situ during annealing of Al-Cu-Fe quasicrystalline and approximant coatings, as well as to image their failure modes in r
Publikováno v:
Surface and Coatings Technology. 191:96-101
A novel route for production of Al–Cu–Fe–Cr and Al–Cu–Fe quasicrystalline and approximant coatings by physical vapor deposition (PVD) methods is described. Powdered elemental stoichiometric mixtures were formed and vacuum pressed at 400 °C
Publikováno v:
Journal of Materials Research. 20:176-182
An as-deposited Al–Cu–Fe–Cr film was annealed in flowing argon to study development of a quasicrystalline approximant microstructure. Sputter profile x-ray photoemission spectroscopy analysis showed oxygen incorporation reached approximately 70
Publikováno v:
Thin Solid Films. 472:96-104
A series of chromium nitride films has been prepared by reactive DC magnetron sputtering onto multiple moving substrates. The films are characterized via an array of experimental techniques, including high-resolution synchrotron radiation X-ray scatt
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 22:2365-2372
A series of Cr films were deposited onto native oxides of (100) Si substrates via a confocal deposition geometry in a magnetron sputter chamber. The film growth chamber was incorporated with an in situ x-ray diffraction system, which allowed the coll
Autor:
L. Fehrenbacher, J. C. Bilello, D. King, M.J. Daniels, B.S. Phillips, Jeffrey S. Zabinski, K.S. Ketola
Publikováno v:
Tribology Letters. 17:435-443
A series of AlCuFe films were deposited by magnetron sputtering and subjected to X-ray diffraction and tribological testing to elucidate the correlation between quasicrystalline phase content and coefficient of friction. The sputter target was a pres
Publikováno v:
Surface and Coatings Technology. 185:329-339
The effects of deposition conditions on phase formation, crystallographic characteristics, residual stress, and morphology of chromium nitride films have been studied. The films were prepared via reactive magnetron sputtering with a confocal depositi