Výsledky vyhledávání - "J. F. Bickley"

Akademický článek

Deposition of HfO2 Films by Liquid Injection MOCVD Using a New Monomeric Alkoxide Precursor, [Hf(dmop)4]We are grateful to Epichem Limited and the EPSRC for support of this work. We are also grateful to Dr. G. W. Critchlow (Institute of Surface Science and Technology, University of Loughborough, UK) for provision of the AES data.

Autor: Y. F. Loo, R. O'Kane, A. C. Jones, H. C. Aspinall, R. J. Potter, P. R. Chalker, J. F. Bickley, S. Taylor, L. M. Smith

Publikováno v: Chemical Vapor Deposition; Jul2005, Vol. 11 Issue 6/7, p299-305, 7p

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