Zobrazeno 1 - 3
of 3
pro vyhledávání: '"J T. Kelliher"'
Autor:
Richard E. Cavicchi, Frank Dimeo, J T. Kelliher, Stephen Semancik, John A. Small, John S. Suehle, John T. Armstrong, N. H. Tea
Publikováno v:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:131-138
Through the use of silicon micromachining, we have developed a microhotplate structure capable of reaching temperatures in excess of 500 °C, onto which thin films have been selectively grown via metalorganic chemical vapor deposition. The microhotpl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13d14b4389db60fd44d5d441bd9cf171
https://doi.org/10.1116/1.580959
https://doi.org/10.1116/1.580959
Publikováno v:
MRS Proceedings. 495
Amorphous silicon carbide (SiC) was deposited by plasma enhanced chemical vapor deposition (PECVD) in an Applied Materials (AMT5000) tool from sources of trimethylsilane (3MS) and either argon or nitrogen. A deposition rate of ≈ 800 nm/min on a 150
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::620ca6d27af13ab3260fab8eaec79362
https://doi.org/10.1557/proc-495-159
https://doi.org/10.1557/proc-495-159
Publikováno v:
MRS Proceedings. 441
A method of studying thin film growth and materials processing using micromachined Si-based structures is presented. The microsubstrate platforms (called “microhotplates”) allow temperature control during deposition, andin situmonitoring of the e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cba25eba8e896bd5f8885c0ef429a28
https://doi.org/10.1557/proc-441-69
https://doi.org/10.1557/proc-441-69