Výsledky vyhledávání - "J T. Kelliher"

In situconductivity characterization of oxide thin film growth phenomena on microhotplates

Autor: Richard E. Cavicchi, Frank Dimeo, J T. Kelliher, Stephen Semancik, John A. Small, John S. Suehle, John T. Armstrong, N. H. Tea

Publikováno v: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16:131-138

Through the use of silicon micromachining, we have developed a microhotplate structure capable of reaching temperatures in excess of 500 °C, onto which thin films have been selectively grown via metalorganic chemical vapor deposition. The microhotpl

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::13d14b4389db60fd44d5d441bd9cf171
https://doi.org/10.1116/1.580959

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PECVD of Amorphous Silicon Carbide from Trimethylsilane

Autor: T. R. Neal, P. A. DiFonzo, M. Massuda, J. T. Kelliher

Publikováno v: MRS Proceedings. 495

Amorphous silicon carbide (SiC) was deposited by plasma enhanced chemical vapor deposition (PECVD) in an Applied Materials (AMT5000) tool from sources of trimethylsilane (3MS) and either argon or nitrogen. A deposition rate of ≈ 800 nm/min on a 150

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::620ca6d27af13ab3260fab8eaec79362
https://doi.org/10.1557/proc-495-159

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Observation of Film Growth Phenomena Using Micromachined Structures

Autor: N. H. Tea, S. Sernancik, Frank Dimeo, J. S. Suchle, J T. Kelliher, Richard E. Cavicchi

Publikováno v: MRS Proceedings. 441

A method of studying thin film growth and materials processing using micromachined Si-based structures is presented. The microsubstrate platforms (called “microhotplates”) allow temperature control during deposition, andin situmonitoring of the e

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8cba25eba8e896bd5f8885c0ef429a28
https://doi.org/10.1557/proc-441-69

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