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pro vyhledávání: '"J S Cabaço"'
Autor:
S Magalhães, J S Cabaço, O Concepción, D Buca, M Stachowicz, F Oliveira, M F Cerqueira, K Lorenz, E Alves
Publikováno v:
Journal of Physics D: Applied Physics 56(2023), 245102
In the present work, the importance of determining the strain states of semiconductor compounds with high accuracy is demonstrated. For the matter in question, new software titled LAPAs, the acronym for LAttice PArameters is presented. The lattice pa
Publikováno v:
CrystEngComm. 23:3308-3318
A new software package titled Multiple Reflection Optimization for X-ray Diffraction (MROX) to simulate and fit multiple reflections simultaneously, as well as single reflections is presented. The simulation employs the recursive solution of the dyna
Publikováno v:
Journal of Physics D: Applied Physics. 54:245301
In this work, high quality AlGaN layers, grown by metal organic chemical vapour deposition, on a commercial c-sapphire substrate, were implanted at a fluence of 1 × 10 14 A r + ⋅ c m − 2 . Implantation was performed for energies between 25 and 2
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