Výsledky vyhledávání - "J Job Beckers"

Probing negative ions and electrons in the afterglow of a low-pressure oxygen radiofrequency plasma using laser-induced photodetachment

Autor: J Job Beckers, Z. Marvi, M. Hasani

Publikováno v: Journal of Physics D: Applied Physics, 54(49):495202. Institute of Physics

This paper reports on the further development and improvement of time-resolved laser-induced photodetachment in concert with microwave cavity resonance spectroscopy. The method is applied to measure—with microsecond time resolution—the decaying d

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ead14e6337ecf4ae6956c7785c0ecc97
https://research.tue.nl/nl/publications/be5811c3-651a-415f-8380-928dbe595fef

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The underexposed effect of elastic electron collisions in dusty plasmas

Autor: T. J. A. Staps, Marvin Igor van de Ketterij, J Job Beckers, Bart Platier

Publikováno v: Communications Physics, Vol 4, Iss 1, Pp 1-9 (2021)
Communications Physics, 4(1):231. Springer Nature

Dusty plasmas comprise a complex mixture of neutrals, electrons, ions and dust grains, which are found throughout the universe and in many technologies. The complexity resides in the chemical and charging processes involving dust grains and plasma sp

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2c0351508451445a1103b590065905b8
https://doi.org/10.1038/s42005-021-00734-w

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Influence of a magnetic field on an extreme ultraviolet photon-induced plasma afterglow

Autor: J Job Beckers, Mark A.W. van Ninhuijs, O.J. Luiten, T. J. A. Staps, A. C. Lassise, R. Limpens, Bart Platier

Publikováno v: Journal of Physics D: Applied Physics, 54(43):435205. Institute of Physics

Understanding extreme ultraviolet (EUV) photon-induced plasma dynamics is key to increasing the lifetime of the new generation of lithography machines. The plasma decay times were determined by means of a non-destructive microwave method, microwave c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::242eb5a1387a2ecc087db066eb2fcbb4
https://doi.org/10.1088/1361-6463/ac1885

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Numerical profile correction of microwave cavity resonance spectroscopy measurements of the electron density in low-pressure discharges

Autor: J Job Beckers, P. Meijaard, Bart Platier, T. J. A. Staps, D. Mihailova

Publikováno v: Review of Scientific Instruments, 92(9):093504. American Institute of Physics

Low-temperature plasmas are widely studied in laboratory environments and form the backbone of many industrial processes. Highly energized electrons enable processes such as ionization, dissociation, and plasma chemical reactions, while the heavy spe

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8d8818b2915bba1cd7fc99d2a9373b97
https://doi.org/10.1063/5.0054851

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Charge of clustered microparticles measured in spatial plasma afterglows follows the smallest enclosing sphere model

Autor: Paul W. M. Blom, A Post, A.T.A. Peijnenburg, B. van Minderhout, J Job Beckers, R.M.H. Rompelberg, J.C.A. van Huijstee

Publikováno v: Nature Communications, 12(1):4692. Nature Publishing Group
Nature Communications
Nature Communications, Vol 12, Iss 1, Pp 1-7 (2021)

The plasma-induced charge of non-spherical microparticles is a crucial parameter in complex plasma physics, aerosol science and astrophysics. Yet, the literature describes this charge by two competing models, neither of which has been experimentally

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::426172a9a4efc285d01bb4b68d158946
https://doi.org/10.1038/s41467-021-23604-z

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Step-wise excitation for the determination of the resonance frequency of a microparticle confined in a low pressure plasma

Autor: P. Meijaard, J Job Beckers, T. J. A. Staps

Publikováno v: Physics of Plasmas, 28(8):083502. American Institute of Physics

We propose, test, and analyze a new step-wise excitation approach to quickly obtain, or determine with high accuracy, the resonance frequency of a microparticle confined in the space charge region of a low pressure plasma operated above a horizontal

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::790bb1a4d94e4219036ddae09283f9ee
https://research.tue.nl/nl/publications/a0f08229-c374-45b4-929c-215609853531

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An atomic hydrogen etching sensor for H2 plasma diagnostics

Autor: J Job Beckers, C. A. de Meijere, EA Osorio, Vadim Yevgenyevich Banine, D. P. J. van Leuken, R. M. van der Horst

Publikováno v: Review of Scientific Instruments, 92(6):063518. American Institute of Physics

A simple and selective new technique for atomic hydrogen flux measurements in a hydrogen plasma environment is introduced and demonstrated in this work. This technique works by measuring the etching rate of an amorphous carbon film and translating th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::04434123ad05baff83bbe37943b2ef70
http://www.scopus.com/inward/record.url?scp=85108090977&partnerID=8YFLogxK

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Addendum: Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy (2018 J PHYS D APPL PHYS 52 034004)

Autor: Gerrit Jacobus Hendrik Brussaard, O.J. Luiten, Vadim Yevgenyevich Banine, Bart Platier, M. A. W. van Ninhuijs, F. M. J. H. van de Wetering, J Job Beckers

Publikováno v: Journal of Physics D: Applied Physics, 53(35):359401. Institute of Physics

A new approach for an in-line beam monitor for ionizing radiation was introduced in a recent publication (Beckers, J., et al. "Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode micr

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1efe06b5c1a1f4210ae742d1a5600a98
https://doi.org/10.1088/1361-6463/ab8f53

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Charge control of micro-particles in a shielded plasma afterglow

Autor: J Job Beckers, Boy van Minderhout, Bart Platier, J.C.A. van Huijstee, Paul P.M. Blom, Ton Peijnenburg, Gerrit Kroesen

Publikováno v: Plasma Sources Science and Technology, 29(6):065005. Institute of Physics

In this work, charge control of micro-particles from ~ -40 to +10 elementary charges is presented. This is achieved at 0.9 mbar argon in the spatial afterglow of an inductively coupled plasma by solely changing the strength of an externally applied e

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6a9e46929ae7e769ec60e94b12da5d81
https://doi.org/10.1088/1361-6595/ab8e4f

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Probing Collisional Plasmas with MCRS: Opportunities and Challenges

Autor: Wilbert L. IJzerman, J Job Beckers, T. J. A. Staps, Marc van der Schans, Bart Platier, P.M.J. Koelman

Publikováno v: Applied Sciences, Vol 10, Iss 4331, p 4331 (2020)
Applied Sciences, 10(12):4331. Multidisciplinary Digital Publishing Institute (MDPI)

Since the 1940s, Microwave Cavity Resonance Spectroscopy (MCRS) has been used to investigate a variety of solids, gases, and low-pressure plasmas. Recently, the working terrain of the diagnostic method has been expanded with atmospheric-pressure plas

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eb0a9ab31c175e6da17b669901f14da6
https://www.mdpi.com/2076-3417/10/12/4331

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