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Autor:
Florian Kurz, Jürgen Michael Süss, Thomas Plach, Bernhard Rebhan, Viorel Dragoi, Thomas Wagenleitner, Dominik Zinner
Publikováno v:
ECS Transactions. 75:345-353
The increased microelectronic devices complexity is raising a strong demand for high wafer-to-wafer (w2w) alignment accuracy allowing for high levels of integration by wafers stacking. One of the major aspects for the alignment is the overlay alignme