Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Jérôme Meziere"'
Autor:
Jérôme Meziere, François Rieutord, F. Fournel, Hubert Moriceau, Pascal Gentile, B. Aspar, C. Morales, Alexis Bavard, Joël Eymery, A. Pascale, O. Rayssac, Benoit Bataillou, Christophe Maleville, Anne-Marie Charvet
Publikováno v:
Solid State Phenomena. :29-32
Direct Wafer Bonding has been widely developed and is very attractive for a lot of applications. Using original techniques based on direct bonding enable to carry out specific engineered substrates. Various illustrations are given among which twisted
Publikováno v:
Journal of Crystal Growth. 267:436-451
This paper summarizes recent experimental and simulation results on etching, growth rates and nitrogen incorporation in silicon carbide epitaxial layers grown in a horizontal hot-wall chemical vapor deposition reactor. The combination of heat and mas
Autor:
Jérôme Meziere, Michel Pons, Elisabeth Blanquet, Pierre Ferret, Lea Di Cioccio, Thierry Billon
Publikováno v:
Materials Science Forum. :731-734
Autor:
Roland Madar, Michail Anikin, Lea Di Cioccio, Jérôme Meziere, Michel Pons, Etienne Pernot, Thierry Billon, Francis Baillet, J.M. Dedulle, Pierre Ferret, Elisabeth Blanquet
Publikováno v:
Journal of Physics: Condensed Matter. 16:S1579-S1595
High temperature epitaxial processes for SiC bulk and thin films by physical vapour transport and chemical vapour deposition are reviewed from an academic point of view using heat and mass transfer modelling and simulation. The objective is to show t
Autor:
Lea Di Cioccio, Pierre Ferret, Elisabeth Blanquet, Jérôme Meziere, Jean Marc Dedulle, Thierry Billon, Michel Pons
Publikováno v:
Materials Science Forum. :141-144
Autor:
Stephane Wan Tang Kuan, Pierre Ferret, Jérôme Meziere, Roland Madar, Michel Pons, Elisabeth Blanquet, Thierry Billon, Lea Di Cioccio
Publikováno v:
Materials Science Forum. :223-226
Autor:
Jérôme Meziere, Tobias U. Schülli, Pascal Gentile, Alexis Bavard, A. Pascale, Joël Eymery, F. Fournel
Publikováno v:
Surface Science : A Journal Devoted to the Physics and Chemistry of Interfaces
Surface Science : A Journal Devoted to the Physics and Chemistry of Interfaces, 2006, 600 (16), pp.3187-3193. ⟨10.1016/j.susc.2006.06.004⟩
Surface Science
Surface Science, Elsevier, 2006, 600 (16), pp.3187-3193. ⟨10.1016/j.susc.2006.06.004⟩
Surface Science : A Journal Devoted to the Physics and Chemistry of Interfaces, 2006, 600 (16), pp.3187-3193. ⟨10.1016/j.susc.2006.06.004⟩
Surface Science
Surface Science, Elsevier, 2006, 600 (16), pp.3187-3193. ⟨10.1016/j.susc.2006.06.004⟩
International audience; The self-organized growth of germanium quantum dots on square nanopatterned Si(0 0 1) substrates is investigated by scanning tunnelling microscopy (STM) and grazing incidence X-ray diffraction (GIXRD) techniques. A regular sur
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::58c74d702feaf1f45ef4cf05aaaaac47
https://hal.science/hal-01876867
https://hal.science/hal-01876867
Publikováno v:
Journal of Crystal Growth
Journal of Crystal Growth, Elsevier, 2005, 275 (1-2), pp.e1609-e1613. ⟨10.1016/j.jcrysgro.2004.11.177⟩
Journal of Crystal Growth, 2005, 275 (1-2), pp.e1609-e1613. ⟨10.1016/j.jcrysgro.2004.11.177⟩
Journal of Crystal Growth, Elsevier, 2005, 275 (1-2), pp.e1609-e1613. ⟨10.1016/j.jcrysgro.2004.11.177⟩
Journal of Crystal Growth, 2005, 275 (1-2), pp.e1609-e1613. ⟨10.1016/j.jcrysgro.2004.11.177⟩
International audience; A square surface nanopatterning is obtained by etching a buried dislocation network realised by a specific molecular bonding method. This template is used to organise the germanium quantum dot growth. The initial surface morph
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::486654aa071015cc1656d9f6eac93a6e
https://hal.archives-ouvertes.fr/hal-01875068
https://hal.archives-ouvertes.fr/hal-01875068
Autor:
Roland Madar, Jean Marc Dedulle, Michel Pons, Thierry Billon, Pierre Ferret, Elisabeth Blanquet, Stephane Wan Tang Kuan, Claude Bernard, Lea Di Cioccio, Jérôme Meziere
Publikováno v:
Scopus-Elsevier
The growth of thick epitaxial 4H-SiC layers with low defect density is an essential step for the fabrication of SiC based devices. Cold- and hot wall reactors using silane and propane diluted in hydrogen were used in this study. The typical growth te
Publikováno v:
HAL
N° de brevet: FRA 0652981. 2007
N° de brevet: FRA 0652981. 2007
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::1b4b03f6210d556fc6b29bee2869af28
https://hal.archives-ouvertes.fr/hal-00170052
https://hal.archives-ouvertes.fr/hal-00170052