Zobrazeno 1 - 10
of 172
pro vyhledávání: '"Iwao Nishiyama"'
Publikováno v:
Plant Production Science, Vol 4, Iss 3, Pp 220-226 (2001)
Many studies have confirmed that exogenous cytokinins increase tillering in grasses as wheat, oat and barley. In this study, the effects of benzylaminopurine (BA) on tillering of two rice cultivars, North Rose with low tillering ability and Sasanishi
Externí odkaz:
https://doaj.org/article/30629575e4f5447f97f110d0505516da
Publikováno v:
Plant Production Science, Vol 3, Iss 3, Pp 299-305 (2000)
The difference in the number of pollen grains may be the primary factor determining the resistance to cool weather at the young microspore stage in rice (Oryza sativa L.) cultivars. To confirm this hypothesis, we compared the number of pollen grains
Externí odkaz:
https://doaj.org/article/733532ffa2c94052be13d4c3a8c2a95e
Publikováno v:
Plant Production Science, Vol 3, Iss 4, Pp 253-349 (2000)
In spite of a large number of reports on the effects of cytokinin application on growth of wheat, barley and other crops, the impact of it on rice growth has rarely been investigated. The objective of this study was to examine the effects of benzylam
Externí odkaz:
https://doaj.org/article/de0048517a204ac790f342de6b67d027
Publikováno v:
Thin Solid Films. 575:110-112
Hydrogen radical cleaning using the hot-wire (HW) method is considered the future technology for the optical system of extreme ultraviolet lithography (EUVL). However, the optical system of EUVL has a low heat resistance. Therefore, it is necessary t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbbecd262a7ad4a5aeca8e9c8e472c1c
https://doi.org/10.1016/j.tsf.2014.10.030
https://doi.org/10.1016/j.tsf.2014.10.030
Publikováno v:
Thin Solid Films. 516:2050-2057
Mo–Si multilayer structures were grown by ion-beam and magnetron sputtering to make high-performance mask blanks for practical use in extreme-ultraviolet (EUV) lithography. For ion-beam sputtering, the effect of using Ar or Xe as the sputtering gas
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a224e8682612adf99d0896a5fc0f6f3c
https://doi.org/10.1016/j.tsf.2007.07.182
https://doi.org/10.1016/j.tsf.2007.07.182
Publikováno v:
Japanese Journal of Crop Science. 77:498-504
著者らは前報において, 地上部の量あるいは穎花数に対する相対的根量, さらに根の生理的活性がイネの穂ばらみ期耐冷性と相関関係があることを明らかにした. 本研究は, 一般に耐冷性
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb7b951b9144908552208c71308f9995
https://doi.org/10.1626/jcs.77.498
https://doi.org/10.1626/jcs.77.498
Autor:
Iwao Nishiyama
Publikováno v:
The Review of Laser Engineering. 36:673-683
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc4e427812ac053c63adfebfefd4f7d1
https://doi.org/10.2184/lsj.36.673
https://doi.org/10.2184/lsj.36.673
Autor:
Akira Izumi, Shinji Miyagaki, Kumi Motai, Akira Namiki, Hiroaki Oizumi, Tomoya Ueno, Iwao Nishiyama
Publikováno v:
Thin Solid Films. 516:839-843
A method of removing contaminants from Ru-capped Mo/Si multilayer mirrors for extreme ultraviolet lithography has been developed. It employs atomic hydrogen generated by a heated catalyzer consisting of a W wire. A new experimental system was designe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7d838998e365fb91693620176f460cff
https://doi.org/10.1016/j.tsf.2007.06.182
https://doi.org/10.1016/j.tsf.2007.06.182
Publikováno v:
Applied Surface Science. 253:8699-8704
The oxidation and reduction of Ru thin films grown on a Si(1 0 0) surface were studied by X-ray photoemission spectroscopy (XPS). Ru thin films were oxidized with O 2 plasma generated by an rf discharge, and their XPS spectra were measured. The spect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::63991b2442ab7ed7b1f8cec5ea038313
https://doi.org/10.1016/j.apsusc.2007.04.063
https://doi.org/10.1016/j.apsusc.2007.04.063
Autor:
Yuusuke Tanaka, Junichi Onodera, Daiju Shiono, Takaaki Kumise, Atsuko Yamaguchi, Hiroaki Oizumi, Iwao Nishiyama, Hideo Hada, Taku Hirayama
Publikováno v:
Microelectronic Engineering. 84:1049-1053
We designed and synthesized a new partially-protected polyphenol, 25X-MBSA-M, for which the position and number of protected hydroxyl groups have no dispersion, and evaluated the EUV patterning performance of a chemically amplified positive-tone resi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::72e3bfb64fd450a1828b574f704167b6
https://doi.org/10.1016/j.mee.2007.01.052
https://doi.org/10.1016/j.mee.2007.01.052