Zobrazeno 1 - 10
of 310
pro vyhledávání: '"Ivo W Rangelow"'
Autor:
Jaqueline Stauffenberg, Michael Reibe, Anja Krötschl, Christoph Reuter, Ingo Ortlepp, Denis Dontsov, Steffen Hesse, Ivo W. Rangelow, Steffen Strehle, Eberhard Manske
Publikováno v:
Micro and Nano Engineering, Vol 19, Iss , Pp 100201- (2023)
In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible
Externí odkaz:
https://doaj.org/article/694ac5c75e5041bc82d46645cd033f5f
Autor:
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 2855-2882 (2018)
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the sub
Externí odkaz:
https://doaj.org/article/b7160a201e20410287590c4f76d1362d
Publikováno v:
Micromachines, Vol 12, Iss 4, p 357 (2021)
The actual technical implementation of conventional interferometers is quite complex and requires manual manufacturing. In combination with the required construction space defined by the optical setup, their applications are limited to selected measu
Externí odkaz:
https://doaj.org/article/941dcb8a406b4726b4304074fa8b73f1
Publikováno v:
Proceedings, Vol 56, Iss 1, p 12 (2020)
Standing wave interferometers (SWIs) show enormous potential for miniaturization because of their simple linear optical set-up, consisting only of a laser source, a measuring mirror and two standing wave sensors for obtaining quadrature signals. To r
Externí odkaz:
https://doaj.org/article/428f094aa88f4be987e4fb39e5de3029
Autor:
Jaqueline Stauffenberg, Ingo Ortlepp, Christoph Reuter, Mathias Holz, Denis Dontsov, Christoph Schäffel, Steffen Strehle, Jens-Peter Zöllner, Ivo W. Rangelow, Eberhard Manske
Publikováno v:
Proceedings, Vol 56, Iss 1, p 34 (2020)
The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used
Externí odkaz:
https://doaj.org/article/59008b57b89d43e6af819dbff85d0a4e
Autor:
Oliver Dannberg, Andreas Meister, Stephan Gorges, Tino Hausotte, Xinrui Cao, Taras Sasiuk, Ivo W. Rangelow, Johannes Kirchner, Johann Reger, Laura Mohr-Weidenfeller, Christoph Reuter, Stefan Sinzinger, Lena Zentner, Steffen Strehle, Roland Füßl, Eberhard Manske, Jaqueline Stauffenberg, Martin Hofmann, David Fischer, Ralf Schienbein, René Theska, Carsten Reinhardt, Shraddha Supreeti, Florian Fern, Thomas Fröhlich, Christoph Weise, Christoph Dr. Schäffel, Jens-Peter Zöllner, Ingo Ortlepp
Publikováno v:
Nanomanufacturing and Metrology. 4:132-148
The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and
Publikováno v:
Nanomanufacturing and Metrology. 4:190-199
This paper describes a standing-wave interferometer with two laser sources of different wavelengths, diametrically opposed and emitting towards each other. The resulting standing wave has an intensity profile which is moving with a constant velocity,
Autor:
Denis Dontsov, Ingo Ortlepp, Ulrike Blumröder, Christoph Dr. Schäffel, Jaqueline Stauffenberg, Eberhard Manske, Mathias Holz, Ivo W. Rangelow
Publikováno v:
tm - Technisches Messen. 88:581-589
This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in
Autor:
Fangzhou Xia, Chen Yang, Yi Wang, Kamal Youcef-Toumi, Christoph Reuter, Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow
Publikováno v:
Nanomaterials, Vol 9, Iss 7, p 1013 (2019)
Atomic force microscopy is a powerful topography imaging method used widely in nanoscale metrology and manipulation. A conventional Atomic Force Microscope (AFM) utilizes an optical lever system typically composed of a laser source, lenses and a four
Externí odkaz:
https://doaj.org/article/efa99da9f0974b23958dbbede89a2650
Autor:
Ewelina Gacka, Piotr Kunicki, Paulina Łysik, Krzysztof Gajewski, Paulina Ciechanowicz, Damian Pucicki, Dominika Majchrzak, Teodor Gotszalk, Tomasz Piasecki, Tito Busani, Ivo W. Rangelow, Detlef Hommel
Publikováno v:
Ultramicroscopy. 248:113713