Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Ivo De Jong"'
Autor:
Ivo De Jong
Minute-by-minute chronicle of the U.S. Eighth Air Force's bombing mission against German airfields in Holland.
Autor:
Ivo De Jong
Minute-by-minute chronicle of a single Eighth Air Force bombing mission in World War IIDramatic story of how B-17s and B-24s bombed targets inside GermanyCaptures the courage and confusion of aerial combatDetails the first combat use of remote-contro
Autor:
David Ockwell, Frank Bornebroek, Hans Meiling, Noreen Harned, Peter Kűrz, Ivo de Jong, Rudy Peeters, Ron Kool, Stuart Young, Martin Lowisch, Judon Stoeldraijer, Christian Wagner, Wim de Boeij, Henk Meijer, Eelco van Setten
Publikováno v:
SPIE Proceedings.
ASML's NXE platform is a multi-generation TWINSCAN™ platform using an exposure wavelength of 13.5nm, featuring a plasma source, all-reflective optics, and dual stages operating in vacuum. The NXE:3100 is the first product of this NXE platform. With
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::246ab0dc9536cc28ccd35294100d64c2
https://doi.org/10.1117/12.916971
https://doi.org/10.1117/12.916971
Autor:
John Zimmerman, Ivo de Jong, Rudy Peeters, Hans Meiling, Jose Bacelar, Alek C. Chen, Stef Hendriks, Noreen Harned, Leon Martin Levasier, Mark van de Kerkhof, David Ockwell, Eelco van Setten, Ron Kool, Judon Stoeldraijer, Stuart Young, Peter Kuerz, Erik Roelof Loopstra, Martin Lowisch, Christian Wagner
Publikováno v:
Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications.
With the 1st NXE:3100, 0.25NA and 0.8σ conventional illumination, being operational at a Semiconductor Manufacturer, we enter the next phase in EUVL implementation. Since 2006 process and early device verification has been done using the two Alpha D
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1c05c76da97674cab87efc4c9857c17e
https://doi.org/10.1109/vtsa.2011.5872264
https://doi.org/10.1109/vtsa.2011.5872264
Autor:
John Zimmerman, Ivo de Jong, Rudy Peeters, Hans Meiling, Erik Roelof Loopstra, David Ockwell, Christian Wagner, Stef Hendriks, Noreen Harned, Mark van de Kerkhof, Stuart Young, Martin Lowisch, Judon Stoeldraijer, Peter Kuerz, Ron Kool, Jose Bacelar, Leon Martin Levasier, Eelco van Setten
Publikováno v:
SPIE Proceedings.
With the 1st NXE:3100 being operational at a Semiconductor Manufacturer and a 2nd system being shipped at the time of writing this paper, we enter the next phase in the implementation of EUV Lithography. Since 2006 process and early device verificati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e99fa9e612ac57b93bf405dee29f12bd
https://doi.org/10.1117/12.878603
https://doi.org/10.1117/12.878603