Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Ivan Dolog"'
Publikováno v:
Biomacromolecules. 19:1498-1507
The sequence and helical content of two alanine-rich peptides (AQK18 and GpAQK18, Gp: l-propargylglycine) and their conjugates with poly(ethylene glycol) (PEG) have been investigated by multidimensional mass spectrometry (MS), encompassing electrospr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::17e0b3011217918603d95e6c47f18cb3
https://doi.org/10.1021/acs.biomac.7b01694
https://doi.org/10.1021/acs.biomac.7b01694
Autor:
Sergei F. Lyuksyutov, Dmytro Kashyn, Pavel B. Paramonov, Ewa Rowicka, Ivan Dolog, Tadashi Hirano, Robert Mallik, Michael A. Reagan
Publikováno v:
Current Nanoscience. 4:166-172
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50ff6afdcbb2023e333436b01c38d548
https://doi.org/10.2174/157341308784340868
https://doi.org/10.2174/157341308784340868
Publikováno v:
Surface Science. 600:2972-2979
The adsorption mechanism for the new compound, 7-ethynyl-2,4,9-trithia-tricyclo[3.3.1.13,7]decane (7ETTD), on ultra-thin films (∼3 nm) of CdS is investigated. Multiple reflection absorption IR spectroscopy, in conjunction with inelastic electron tu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de0082d95942848dcd85f2f971d4db4b
https://doi.org/10.1016/j.susc.2006.05.011
https://doi.org/10.1016/j.susc.2006.05.011
Publikováno v:
Journal of Applied Physics. 95:3075-3080
Ultrathin oxygenated amorphous CdTe (a-CdTe:O) films are prepared by rf sputtering of CdTe in a background of argon or argon/nitrogen/oxygen mixtures. Atomic force microscopy (AFM) is used to characterize the films and shows that they have an island
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cd470103a316146fa4cf82a6a6f1ae4
https://doi.org/10.1063/1.1647259
https://doi.org/10.1063/1.1647259
Publikováno v:
Nanotechnology. 14:716-721
We report the observation of anomalously high currents of up to 500µA during direct oxide nanolithography on the surface of n-type silicon {100}. Conventional nanolithography on silicon with an atomic force microscope (AFM) normally involves current
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1cc37e2f4966a90a15916d940ddeae3d
https://doi.org/10.1088/0957-4484/14/7/305
https://doi.org/10.1088/0957-4484/14/7/305
Publikováno v:
Applied Physics Letters. 90:213111
A robust technique, based on vertical (z-lift) manipulation of a negatively biased oscillating atomic force microscope cantilever, is developed which creates raised columnar nanostructures with high aspect ratios (up to 40nm high/150nm wide) on amorp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d661c5d55f4c8c7ac269f6814f3fa696
https://doi.org/10.1063/1.2742910
https://doi.org/10.1063/1.2742910