Zobrazeno 1 - 10
of 33
pro vyhledávání: '"Ishan Wathuthanthri"'
Publikováno v:
Micromachines, Vol 9, Iss 6, p 304 (2018)
The manipulation of droplet mobility on a nanotextured surface by oxygen plasma is demonstrated by modulating the modes of hydrophobic coatings and controlling the hierarchy of nanostructures. The spin-coating of polytetrafluoroethylene (PTFE) allows
Externí odkaz:
https://doaj.org/article/28499070203d4b28ba622ef06ed21d04
Publikováno v:
Micromachines, Vol 8, Iss 9, p 275 (2017)
This is the golden age of scalable micro/nanopatterning, as these methods emerge as an answer to produce industrial-scale nano-objects with a focus on economical sustainability and reliability.[...]
Externí odkaz:
https://doaj.org/article/942d5d3c2bc343638cf61c5236a2d8fe
Publikováno v:
Micromachines, Vol 8, Iss 4, p 131 (2017)
In this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-are
Externí odkaz:
https://doaj.org/article/4674ebf5fa6b4352a691841d8b148e2d
Autor:
Jerome T. Mlack, Nick Edwards, Brian Novak, Annaliese Drechsler, Jordan Merkel, Timothy Vasen, Daniel J. Hannan, Paul Brabant, Ishan Wathuthanthri, Justin Parke, Sam Wanis, Robert S. Howell, Ken A. Nagamatsu
Publikováno v:
2021 IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS).
Publikováno v:
2019 International Wafer Level Packaging Conference (IWLPC).
While developing new processes in the area of microchip electronic packaging, the goal is to increase quality and throughput while lowering cost. In the traditional backend assembly process for mature technologies, the die are singulated, sorted, mou
Autor:
Robert S. Howell, Michael J. Uren, Justin Parke, Shalini Gupta, James W Pomeroy, Ken Nagamatsu, Stefano Dalcanale, Josephine B. Chang, Sarat Saluru, Callum Middleton, Martin Kuball, Ishan Wathuthanthri
Publikováno v:
Middleton, C, Dalcanale, S, Uren, M, Pomeroy, J, Uren, M J, Chang, J, Parke, J, Wathuthanthri, I, Nagamatsu, K, Salaru, S & Kuball, M 2019, ' Thermal transport in Superlattice Castellated Field Effect Transistors ', IEEE Electron Device Letters, vol. 40, no. 9, pp. 1374-1377 . https://doi.org/10.1109/LED.2019.2929424
Heat extraction from novel GaN/AlGaN superlattice castellated field effect transistors developed as an RF switch is studied. The device thermal resistance was determined as 19.1 ± 0.7 K/(W/mm) from a combination of Raman thermographymeasurements, an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a6c44c20c8e9b707902269301b1475a7
https://research-information.bris.ac.uk/ws/files/204211531/Thermal_Transport_in_Superlattice_Castellated_Field_Effect_Transistors.pdf
https://research-information.bris.ac.uk/ws/files/204211531/Thermal_Transport_in_Superlattice_Castellated_Field_Effect_Transistors.pdf
Publikováno v:
Advanced Functional Materials. 30:2070277
Freestanding Photoresist Film: A Versatile Template for Three‐Dimensional Micro‐ and Nanofabrication
Publikováno v:
Advanced Functional Materials. 30:2004129
Publikováno v:
Micromachines, vol 8, iss 9
Micromachines, Vol 8, Iss 9, p 275 (2017)
Micromachines
Micromachines, Vol 8, Iss 9, p 275 (2017)
Micromachines
This is the golden age of scalable micro/nanopatterning, as these methods emerge as an answer to produce industrial-scale nano-objects with a focus on economical sustainability and reliability.[...].
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7ffcbf2a14ad2f44d51f0b5977df41aa
https://escholarship.org/uc/item/8ch5n5q6
https://escholarship.org/uc/item/8ch5n5q6
Autor:
Robert S. Howell, Karen Renaldo, Shalini Gupta, Justin Parke, Bettina Nechay, Ishan Wathuthanthri, Pavel Borodulin, Megan Snook, Ron Freitag, H. George Henry, Matt King, Eric J. Stewart, Matt Torpey
Publikováno v:
2016 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS).
FET-based switched filters do not occupy a large space in the literature due to the high loss of the switches relative to other technologies. The Super-Lattice Castellated Field Effect Transistor (SLCFET) is a low loss, high isolation, broadband RF s