Zobrazeno 1 - 10
of 45
pro vyhledávání: '"Isabelle Trimaille"'
Autor:
Pierre-Etienne Wolf, Isabelle Trimaille, Victor Doebele, Aristée Benoit-Gonin, Etienne Rolley, Annie Grosman, P. Spathis, Laurent Cagnon, Fabien Souris, Marine Bossert
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 37(49)
We measured sorption isotherms for helium and nitrogen in wide temperature ranges and for a series of porous silicon samples, both native samples and samples with reduced pore mouth, so that the pores have an ink-bottle shape. Combining volumetric me
Publikováno v:
Langmuir
Langmuir, American Chemical Society, 2020, 36 (37), pp.11054-11060. ⟨10.1021/acs.langmuir.0c01939⟩
Langmuir, American Chemical Society, 2020, 36 (37), pp.11054-11060. ⟨10.1021/acs.langmuir.0c01939⟩
The present paper investigates strain-induced sorption in mesoporous silicon. Contrarily to a previous report based on indirect evidence, we find that external mechanical strain or stress has no measurable impact on sorption isotherms, down to a rela
Publikováno v:
Langmuir. 37:7626-7626
Publikováno v:
Nuclear instruments, methods in physics research. Section B, 219-20
the Sixteenth International Conference on Ion Beam Analysis
the Sixteenth International Conference on Ion Beam Analysis, 2004, France. pp.856-861., ⟨10.1016/j.nimb.2004.01.176⟩
the Sixteenth International Conference on Ion Beam Analysis
the Sixteenth International Conference on Ion Beam Analysis, 2004, France. pp.856-861., ⟨10.1016/j.nimb.2004.01.176⟩
We have deposited thin films (3.5, 7.5 and 22 nm) by atomic layer deposition (ALD) using HfCl 4 and H 2 O precursors at 350 °C. Growth, thermal annealing and thermal reoxidation of the thin hafnium oxide layers under controlled ultra-dry oxygen atmo
Publikováno v:
Repositório Institucional da UFRGS
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2004, 95, pp.1770-1773. ⟨10.1063/1.1639139⟩
Journal of Applied Physics, 2004, 95, pp.1770-1773. ⟨10.1063/1.1639139⟩
Universidade Federal do Rio Grande do Sul (UFRGS)
instacron:UFRGS
Journal of Applied Physics
Journal of Applied Physics, American Institute of Physics, 2004, 95, pp.1770-1773. ⟨10.1063/1.1639139⟩
Journal of Applied Physics, 2004, 95, pp.1770-1773. ⟨10.1063/1.1639139⟩
We present some experimental results and propose a reaction-diffusion model to describe thermal growth of silicon oxynitride films on Si in NO and N2O, as well as annealing in NO of thermally grown silicon oxide films on Si. We obtain growth kinetics
Autor:
Claudio Radtke, Isabelle Trimaille, S. Rigo, Ian Vickridge, Fernanda Chiarello Stedile, Israel Jacob Rabin Baumvol, J.-J. Ganem
Publikováno v:
Applied Surface Science. :570-574
We investigated the limiting step of thermal growth of SiO2 on SiC. For that we determined the incorporation of oxygen during different stages of the oxidation process of 6H-SiC wafers as well as of Si wafers, for comparison. Oxidations in natural dr
Autor:
L. G. Gosset, F. Martin, Isabelle Trimaille, A. Ermolieff, O. Renault, D. Rouchon, M. N. Séméria, J.-F. Damlencourt, J.-J. Ganem, Ph. Holliger
Publikováno v:
Journal of Non-Crystalline Solids. 303:17-23
Thin Al 2 O 3 layers were grown by atomic layer deposition using trimethylaluminum (TMA) and water as precursors on 1.2 nm thermal SiO 2 and HF cleaned Si surfaces. The stoichiometry and the contamination (H, OH and C) of as-deposited and N 2 anneale
Publikováno v:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 2002, 190, pp.574. ⟨10.1016/S0168-583X(01)01303-9⟩
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2002, 190, pp.574. ⟨10.1016/S0168-583X(01)01303-9⟩
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Elsevier, 2002, 190, pp.574. ⟨10.1016/S0168-583X(01)01303-9⟩
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2002, 190, pp.574. ⟨10.1016/S0168-583X(01)01303-9⟩
SiC is a large band gap semiconductor, promising for high power and high frequency devices. The thermal oxide is SiO2 however the growth rates of thermal oxide on SiC are substantially slower than on Si, and different along the polar directions ( 〈
Publikováno v:
Journal of Non-Crystalline Solids. 280:143-149
In this work, we investigate by nuclear reaction analysis (NRA), electron paramagnetic resonance (EPR) spectroscopy and atomic force microscopy (AFM) the NO-induced modifications of the physical properties of oxide layers of thickness 20 nm), and typ
Publikováno v:
Journal of The Electrochemical Society. 146:4586-4589
The chemical reactions in the system O{sub 2}-NO{sub x} has been studied in a conventional furnace. The reaction rates of formation and decomposition of NO{sub x} have been measured by monitoring the isotopic concentration in a closed system (convent