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Chemical abrasion is a technique that combines thermal annealing and partial dissolution in hydrofluoric acid (HF) to selectively remove radiation-damaged portions of zircon crystals prior to U–Pb isotopic analysis, and it is applied ubiquitously t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::018c3c91d76a2df6911e929b95ac93b7
https://gchron.copernicus.org/preprints/gchron-2022-19/
https://gchron.copernicus.org/preprints/gchron-2022-19/
