Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Isaac W. Moran"'
Autor:
Kenneth R. Carter, Isaac W. Moran
Publikováno v:
The Journal of Physical Chemistry C. 123:5736-5745
Within molecular electronics, the molecular-scale transistor provides a compelling and central device. While substantial efforts have been expended on this subject, current embodiments typically involve cumbersome gating with nonintuitive routes for
Publikováno v:
Soft matter. 4(1)
Soft UV-imprint lithography at sub-micron dimensions was achieved in thin films of photopolymer resist. The imprinting was enabled by overcoming resist absorption by polydimethylsiloxane (PDMS) through surface treatment with a layer of (heptadecafluo
Autor:
Melissa M. Sprachman, James L. Bachman, Samuel D. Dahlhauser, Isaac W Moran, David Carter, Eric V. Anslyn
Publikováno v:
Bioconjugate chemistry. 31(9)
A hybrid approach to covalently detachable molecules for nanoparticle capture and release from several custom-functionalized surfaces is described. This new surface chemistry capability provides a means for reversible binding of functionalized nanopa
Publikováno v:
Small. 7:2669-2674
Easy soft imprint nanolithography (ESINL) is employed in the patterning of multiple olymer brushes. This new approach to soft lithography is found to be uniquely effective at patterning brushes both prior to and subsequent to grafting of the polymer
Autor:
Vincent M. Rotello, Yuval Ofir, Chandramouleeswaran Subramani, Kenneth R. Carter, Isaac W. Moran
Publikováno v:
Advanced Materials. 22:3608-3614
Nanoimprint lithography (NIL) is viewed as an alternative nanopatterning technique to traditional photolithography, allowing micrometer-scale and sub-hundred-nanometer resolution as well as three-dimensional structure fabrication. In this Research Ne
Autor:
Yuval Ofir, Vincent M. Rotello, Isaac W. Moran, Kenneth R. Carter, Myoung-Hwan Park, Brian J. Jordan, Chandramouleeswaran Subramani, Debabrata Patra
Publikováno v:
Advanced Functional Materials. 19:2937-2942
Polyethyleneimine (PEI) is used as a scaffold for integrated top-down/bottom-up fabrication. In this synergistic strategy, patterned PEI surfaces are created using thermal nanoimprint lithography (NIL) using a sacrificial polystyrene (PS) overlayer.
Autor:
Kenneth R. Carter, Isaac W. Moran
Publikováno v:
Langmuir. 25:9232-9239
A simple and effective means for passivating crystalline silicon is reported by the use of free-radical polymerization (FRP) to directly graft polymer chains to a hydride-terminated surface (Si-H). Complete surface coverage and passivation was achiev
Publikováno v:
Tetrahedron. 64:11831-11838
Four different Cp2TiCl-activated radical sources (1,4-butanediol diglycidyl ether, benzaldehyde, (1-bromoethyl)benzene, and benzoyl peroxide) were investigated as initiators in the Cp2TiCl-catalyzed living radical polymerization of styrene (St). The
Publikováno v:
Small. 4:1176-1182
Enhancements in both the rate and extent of grafting of poly(9,9'-n-dihexyl fluorene) (PDHF) onto flat and nanopatterned crosslinked photopolymer films are described. Reactivity of the surfaces toward grafting via the Yamamoto-type Ni(0)-mediated cou
Publikováno v:
Chemistry of Materials. 20:4595-4601
A new robust and exceptionally simple procedure for soft nano-imprint lithography (Soft-NIL) is described, which provides easy access to nanoscale patterns of a host of active materials on a Si/SiOx surface. Partial curing of a thiol-ene based UV cro