Pattern distortion of the stencil reticle caused by stress of silicon membrane and resist on the reticle.

Autor: Takahashi, Shin-ichi, Okada, Masashi, Katakura, Norihiro, Irita, Takeshi, Kawata, Shintaro

Publikováno v: Proceedings of SPIE; Nov2002, Issue 1, p798-806, 9p

Highly accurate CD control at stitching region for electron-beam projection lithography.

Autor: Fujiwara, Tomoharu, Irita, Takeshi, Shimizu, Sumito, Yamamoto, Hajime, Suzuki, Kazuaki

Publikováno v: Proceedings of SPIE; Nov2001, Issue 1, p727-735, 9p

Direct measurement of chromatic aberrations induced by SiNx continuous membrane mask.

Autor: Yahiro, Takehisa, Suzuki, Shohei, Irita, Takeshi, Kawata, Shintaro, Suzuki, Kazuaki

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2002, Vol. 20 Issue 6, p2634-2639, 6p

Direct measurement of Coulomb effects in electron beam projection lithography.

Autor: Yahiro, Takehisa, Suzuki, Shohei, Irita, Takeshi, Hirayanagi, Noriyuki, Shimizu, Hiroyasu, Kojima, Shinichi, Morita, Kenji, Kawata, Shintaro, Okino, Teruaki, Suzuki, Kazuaki

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2001, Vol. 19 Issue 6, p2468-2473, 6p

Fabrication of TE/TM Mode Splitter Using Completely Buried GaAs/GaAlAs Waveguide

Autor: Okamoto, Kazuya, Doi, Masaaki, Irita, Takeshi, Nakano, Yoshiaki, Tada, Kunio

Publikováno v: Japanese Journal of Applied Physics; January 1995, Vol. 34 Issue: 1 p151-151, 1p