Zobrazeno 1 - 10
of 114
pro vyhledávání: '"Iris Hui-Ru Jiang"'
Autor:
Iris Hui-Ru Jiang, David Chinnery
Publikováno v:
Proceedings of the 2023 International Symposium on Physical Design.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b71daa88b5f79c380e2039aa767c3c3a
https://doi.org/10.1145/3569052.3580221
https://doi.org/10.1145/3569052.3580221
Publikováno v:
2023 IEEE Applied Power Electronics Conference and Exposition (APEC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::80d9b209b2a6cdeeec6de0e7e7c6b2c5
https://doi.org/10.1109/apec43580.2023.10131475
https://doi.org/10.1109/apec43580.2023.10131475
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 40:2331-2344
Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the $\mathcal {N} \mat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::34bb9a1723914632fd2cc37ccfadac45
https://doi.org/10.1109/tcad.2020.3042175
https://doi.org/10.1109/tcad.2020.3042175
Publikováno v:
Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5ad74af4705a339ac98d660051b1509c
https://doi.org/10.1145/3508352.3549388
https://doi.org/10.1145/3508352.3549388
Publikováno v:
Proceedings of the 59th ACM/IEEE Design Automation Conference.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bbaddfc7afd9bcf1907abf143ba83e83
https://doi.org/10.1145/3489517.3530599
https://doi.org/10.1145/3489517.3530599
Publikováno v:
2022 IEEE Intelligent Vehicles Symposium (IV).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d284f6324c1526486f1ee6ff47a35068
https://doi.org/10.1109/iv51971.2022.9827323
https://doi.org/10.1109/iv51971.2022.9827323
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e57f05df39913d66925ae33c3199c04
https://doi.org/10.1117/12.2613681
https://doi.org/10.1117/12.2613681
Publikováno v:
Proceedings of the 2022 International Symposium on Physical Design.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c7effed89e39430069e828ceffa5475
https://doi.org/10.1145/3505170.3506720
https://doi.org/10.1145/3505170.3506720
Publikováno v:
Proceedings of the 2022 International Symposium on Physical Design.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51267d4138e5a415bf5bdf6b6081a13d
https://doi.org/10.1145/3505170.3511801
https://doi.org/10.1145/3505170.3511801
Autor:
Iris Hui-Ru Jiang, Wei-Chun Chang
Publikováno v:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 39:1662-1673
Layout pattern classification, which groups similar layout clips into clusters, underlies a variety of design for manufacturability (DFM) applications, such as hotspot library generation, hierarchical data storage, and yield optimization speedup. The
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b88200dd47f0383e909b7b3a383615c8
https://doi.org/10.1109/tcad.2019.2917849
https://doi.org/10.1109/tcad.2019.2917849