Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Ira Naot"'
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXIV.
On product overlay (OPO) shrink is a key enabler to achieve high yield in integrated circuit manufacturing. One of the key factors to enable accurate measurement on grid (target) is the use of optimized overlay (OVL) mark design to achieve low OPO. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::341ce5481a598e5183ed2d8a900dfdff
https://doi.org/10.1117/12.2552000
https://doi.org/10.1117/12.2552000
Autor:
Ira Naot, Daniel R. Lewin
Publikováno v:
IFAC Proceedings Volumes. 28:203-208
A short-cut method for generating approximate plant-wide dynamic models using flowsheeting data is used in the diagnosis of potential control problems in a reactor-seperator-recycle process. Simplified analysis enables the positive feedback problem a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::944ea2e33356b7d7bafe138a936d1328
https://doi.org/10.1016/s1474-6670(17)47040-6
https://doi.org/10.1016/s1474-6670(17)47040-6
