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pro vyhledávání: '"Ionut Enache"'
Autor:
Nicolas Gherardi, Louison Maechler, Hubert Caquineau, Ionut Enache, Francoise Massines, Thierry Paulmier
Publikováno v:
Plasma Processes and Polymers. 4:806-814
This paper focuses on the understanding of the main mechanisms that participate in the growth process of an SiO 2 -like film in an atmospheric pressure Townsend discharge in N 2 with small ad-mixtures of HMDSO and N 2 O. The approach consists of anal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8579c6060b2152025d98c4314e7e497e
https://doi.org/10.1002/ppap.200700073
https://doi.org/10.1002/ppap.200700073
