Zobrazeno 1 - 10
of 697
pro vyhledávání: '"International Technology Roadmap for Semiconductors"'
Autor:
Brahma, Madhuchhanda1, Bescond, Marc2, Logoteta, Demetrio2, Ghosh, Ram Krishna3, Mahapatra, Santanu4
Publikováno v:
IEEE Transactions on Electron Devices. Mar2018, Vol. 65 Issue 3, p1198-1204. 7p.
Autor:
KORCZYNSKI, ED
Publikováno v:
Solid State Technology. Jun2014, Vol. 57 Issue 4, p24-26. 3p.
Autor:
Goering, Richard
Publikováno v:
Electronic Engineering Times (01921541). 1/23/2006, Issue 1407, p1-61. 3p.
Publikováno v:
Electronic Engineering Times (01921541). 7/18/2005, Issue 1380, p1-62. 3p. 2 Color Photographs.
Publikováno v:
IEEE Transactions on Electron Devices. 68:6586-6591
A physical assessment of the lateral gate-all-around (GAA) nanosheet transistor (NSFET) at the G40M16 node (gate length = 12 nm projected for 2028) of the newly defined beyond-Moore International Roadmap for Devices and Systems [~5 nm node of the pre
Autor:
Alluri Navaneetha, K. Bikshalu
Publikováno v:
Silicon. 14:5855-5862
Demand for accommodating more and new functionalities within a single chip such as SOC needs a novel devices and architecture such as FinFET device instead of MOSFET. FinFET is emerged as non-planar, multigate device to overcome short channel effects
Autor:
Yuko Yasunaga
Publikováno v:
IEEE Transactions on Engineering Management. 68:1179-1194
International Technology Roadmap for Semiconductors (ITRS) is referred to as one of the most successful roadmapping attempts in high-tech industries. ITRS constantly gave orientation to industries (device/equipment/materials), academia, and governmen
Autor:
Robert Phaal, Clive Kerr
Publikováno v:
IEEE Transactions on Engineering Management. 69:3-5
The papers in this special section focus on the topic of roadmapping. Roadmapping emerged from industrial practice more than five decades ago, initially to support integrated product-technology strategy and planning, and championed by firms, such as
Autor:
Shiqi Liu, Weizhou Wang, Jie Yang, Chen Yang, Jing Lu, Xiaotian Sun, Zhigang Song, Nannan Huo
Publikováno v:
Journal of Materials Chemistry C. 9:14683-14698
Recently, a novel two-dimensional (2D) MoSi2N4 has been successfully synthesized and features high carrier mobility, moderate bandgap, and outstanding ambient stability (Science 369, 670, 2020). Through ab initio quantum transport simulations, we inv
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