Zobrazeno 1 - 10
of 2 712
pro vyhledávání: '"Interference Lithography"'
Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations
Autor:
Jerome B. M. Knappett, Blair Haydon, Bruce C. C. Cowie, Cameron M. Kewish, Grant A. van Riessen
Publikováno v:
Journal of Synchrotron Radiation, Vol 31, Iss 3, Pp 485-492 (2024)
Synchrotron light sources can provide the required spatial coherence, stability and control to support the development of advanced lithography at the extreme ultraviolet and soft X-ray wavelengths that are relevant to current and future fabricating t
Externí odkaz:
https://doaj.org/article/36de2a5d34a34a06ad25377ffa4d4d7c
Autor:
Gaurav Singhal, Sujan Dewanjee, Gwangmin Bae, Youngjin Ham, Danny J. Lohan, Kai‐Wei Lan, Jiaqi Li, Tarek Gebrael, Shailesh N. Joshi, Seokwoo Jeon, Nenad Miljkovic, Paul V. Braun
Publikováno v:
Advanced Electronic Materials, Vol 10, Iss 8, Pp n/a-n/a (2024)
Abstract A nanostructured copper oxide (nCO) coating which can be electrochemically reduced to copper metal is demonstrated as an anti‐reflection coating, enabling interference lithography of three‐dimensionally structured templates on a surface
Externí odkaz:
https://doaj.org/article/04686afd8a414b93ac72ec8bb1899854
Publikováno v:
Nanophotonics, Vol 13, Iss 8, Pp 1467-1474 (2024)
Proximity-field nanopatterning (PnP) have been used recently as a rapid, cost-effective, and large-scale fabrication method utilizing volumetric interference patterns generated by conformal phase masks. Despite the effectiveness of PnP processes, the
Externí odkaz:
https://doaj.org/article/0f22cd2138c540b5a0e6e5764aab3816
Publikováno v:
Nanophotonics, Vol 13, Iss 7, Pp 1181-1189 (2024)
As a non-destructive and rapid technique, optical scatterometry has gained widespread use in the measurement of film thickness and optical constants. The recent advances in deep learning have presented new and powerful approaches to the resolution of
Externí odkaz:
https://doaj.org/article/fd1eaf9e86834108a578191b97a6b71a
Publikováno v:
Sensors, Vol 24, Iss 20, p 6617 (2024)
The unique diffractive properties of gratings have made them essential in a wide range of applications, including spectral analysis, precision measurement, optical data storage, laser technology, and biomedical imaging. With advancements in micro- an
Externí odkaz:
https://doaj.org/article/7ecad9331716473bae91e69e92d9e086
Akademický článek
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Publikováno v:
Advanced Photonics Research, Vol 4, Iss 10, Pp n/a-n/a (2023)
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian‐shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography‐defined featu
Externí odkaz:
https://doaj.org/article/8c4683cc56ac40f6bcb3a446063c9c31
Autor:
A.K. Sahoo, P.-H. Chen, C.-H. Lin, R.-S. Liu, B.-J. Lin, T.-S. Kao, P.-W. Chiu, T.-P. Huang, W.-Y. Lai, J. Wang, Y.-Y. Lee, C.-K. Kuan
Publikováno v:
Micro and Nano Engineering, Vol 20, Iss , Pp 100215- (2023)
In this study, we present the performance of an extreme ultraviolet interference lithography (EUV-IL) setup that was reconstructed at Taiwan Light Source 21B2 EUV beamline in the National Synchrotron Radiation Research Center (NSRRC), Taiwan. An easy
Externí odkaz:
https://doaj.org/article/17765dce46814cdeb6793697e9abd2e4
Autor:
Seonghyeon Park, Byeongwoo Kang, Seungwon Lee, Jian Cheng Bi, Jaewon Park, Young Hyun Hwang, Jun-Young Park, Ha Hwang, Young Wook Park, Byeong-Kwon Ju
Publikováno v:
Micromachines, Vol 15, Iss 3, p 328 (2024)
Luminous efficiency is a pivotal factor for assessing the performance of optoelectronic devices, wherein light loss caused by diverse factors is harvested and converted into the radiative mode. In this study, we demonstrate a nanoscale vacuum photoni
Externí odkaz:
https://doaj.org/article/e9094fc17dca4cd180d9dd4325f4eb4a
Akademický článek
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